| 20 |
Hyun Ju Lee, Gyu Weon Hwang, Keun Lee, and Cheol Seong Hwang Atomic-layer-deposition of ferroelectric thin films 5th Asian meeting on Ferroelectrics, Tokyo University of Science, Japan, September 3-5 (2006), Invited |
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| 19 |
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo and Cheol Seong Hwang Correlation between high-k properties and interfacial chemical structure of ALD HfO2 thin films on Si, Si1-xGex and Ge substrates The Electrochemical Society 210th meeting, Moon Palace Resorts, Cancun, Mexico, October 26–November 3 (2006), Invited |
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| 18 |
T. J. Park, M. J. Cho, S. H. Hong, M. H. Seo, J. H. Kim, J. H. Park, C. S. Hwang The Atomic-layer-deposited HfO2 gate dielectric films ; chemistry if interface and electrical performances AVS 52nd International Symposium & Exhibition, Hynes convention center, Boston, MA, USA, October 30-November 4 (2005), Invited |
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| 17 |
Cheol Seong Hwang, Moonjoo Cho, Hongbae Park, Jaehoo Park, and Suk Woo Lee Improvement in High-k HfO3 Films Processing and MOSFET Performances 4th Asian Meeting on Ferroelectrics, Indian Institute of Science, Bangalore, India, December 12-15 (2003), Invited |
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| 16 |
Cheol Seong Hwang High-k HfO2 gate oxide for CMOS applications International Conference on Electroceramics, ICE-2003, Massachusetts 10th European Meeting on Ferroelectricity, Cambridge U.K., Aug 3-8 (2003), Invited |
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| 15 |
Cheol Seong Hwang thickness-dependent dielectric constants and electron transport of (Ba,Sr)TiO3 thin film capacitors having Pt and conducting oxide electrodes International Conference on Electroceramics, ICE-2003, Massachusetts Institute of Technology, Cambridge, Massachusetts, USA, Aug 3-7 (2003), Invited |
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| 14 |
Cheol Seong Hwang, Hongbae Park, Ohseong Kwon, Jaehoo Park, Wandon Kim Review On The Recent Progresses In The DRAM Capacitor Technologies 15th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 9-12 (2003), Invited |
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| 13 |
Cheol Seong Hwang, and Jin Shi-Zhao Low temperature MOCVD of PZT thin films for FeRAM applications MRS 2002 fall meeting, Boston, Ma, USA, December 2 (2002), Invited |
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| 12 |
Cheol seong hwang thickness-dependent dielectric constiants of (Ba,Sr)TiO3 thin films having Pt and conducting oxide electrodes The 4th Japan-Korea Conperence on Ferroelectrics, Osaka university, Osaka, Japan, August 21-23 (2002), Invited |
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| 11 |
Seehwa Jeong, Jin-Shi Zhao, Jieun Lim, Cheol seong Hwang, Young Ki Han, Doo Young Yang, Ki Young Oh A mass-production compatible metal-organic chemical vapor deposition process of Pb(Zr,Ti)O3 thin films at low temperatures International Joint Conference on the Application of Ferroelectrics, Nara-ken New Public Hall, Nara, Japan, May 28- June 1 (2002), Invited |
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