| 53 |
Hyung-Suk Jung, Sang Young Lee, Sang-ho Rha, Hyo Kyeom Kim, Yoon Jang Chung, Jung-Min Park, Weon-Hong Kim, Min-Woo Song, Nae-In Lee, Cheol Seong Hwang A comparative study on the effect of post deposition annealing on the physical property and electrical reliability of Hf1-xZrxOy gate dielectrics SISC, San diego, December 2-4 (2010)
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| 52 |
Un Ki Kim, Jeong Hwan Kim, Him Chan Oh,Yoon Jang Chung, and Cheol Seong Hwang The effect of illumination on the negative bias temperature instability in Zinc Tin oxide thin film transistors 2010 ECS, Las Vegas, October 11-15 (2010), Poster
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| 51 |
Sang Young Lee, Hyung-Suk Jung, Hyo Kyeom Kim, Sang Woon Lee, Yu Jin Choi, and Cheol Seong Hwang The VFB modulation effect of ALD grown Al2O3, SrO, La2O3 capping layers with HfO2 gate dielectrics 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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| 50 |
S.-H. Rha, J. S. Jung, J. H. Kim, U. K. Kim, Y. J. Chung, H.-S Jung, S.Y. Lee, C. S. Hwang Amorphous oxide semiconductor memory using high-k charge trap layer 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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| 49 |
Sora Han, Seong Keun Kim, and Cheol Seong Hwang Structural and Electrical Characterization of TiO2 and Al-doped TiO2 Films on Ir Electrode for Next Generation DRAM Capacitor 2010 ECS, Las Vegas, October 11-15 (2010), Poster
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| 48 |
Jeong Hwan Kim, Un Ki Kim, Yoon Jang Chung, Sang-Ho Rha, Hyung-Suk Jung, Sang Young Lee, Ji Sim Jung, Sang Yoon Lee and Cheol Seong Hwang The effect of light illumination on transfer curve and stability of amorphous Hf-In-ZnO thin film transistors 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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| 47 |
Hyo Kyeom Kim, Hyung-Suk Jung, Jae Hyuck Jang, Sang Young Lee, Cheol Seong Hwang The effect of Hf/(Hf+Si) ratios in Hf1-xSixOy dielectric film on physical and electrical stabilities 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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| 46 |
H.-S Jung, H. K. Kim, J. H. Kim, S. Y. Lee, J.-M. Park, W.-H. Kim, M.-W. Song, N.-I. Lee, C. S. Hwang The effect of nitrogen in HfOxNy and ZrOxNy on dielectric properties and BTI characteristics 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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| 45 |
Kyung Min Kim, Duk Hwang Kwon, Jae Hyuck Jang, Min Hwan Lee, Seul Jie Song, Gun Hwan Kim, Jun Yeong Seok, Bora Lee, Seungwu Han, Miyoung Kim, and Cheol Seong Hwang Identity of the conducting nano-filaments in TiO2 and resistance switching mechanism of TiO2/NiO layer 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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| 44 |
Seong Keun Kim, Sang Woon Lee, Jeong Hwan Han, Bora Lee, Seungwu Han, and Cheol Seong Hwang Capacitors with an equivalent oxide thickness of < 0.5 nm for next generation semiconductor memory 2010 ECS, Las Vegas, October 11-15 (2010), Oral
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