20 |
Oh Seong Kwon, Seong Keun Kim, Cheol Seong Hwang Atomic-Layer-Deposition of SrTiO3 Thin Films Using Remote-Plasma Activated H2O as an Oxidant MRS 2002 fall meeting, Boston, Ma, USA, Dec 2 (2002)
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19 |
Hong Bae Park, Moonju Cho, Jaehoo Park, Cheol Seong Hwang Thermal Stability of Atomic-Layer-Deposited Thin Films on the SiN-Passivated Si Substrate MRS 2002 fall meeting, Boston, Ma, USA, Dec 2 (2002)
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18 |
Seong Keun Kim, Oh Seong Kwon, Cheol Seong Hwang Electrical Characterization of Atomic-layer Deposited SrTiO3 Thin Films for CMOS Application MRS 2002 fall meeting, Boston, Ma, USA, Dec 2 (2002)
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17 |
Jin Shi-Zhao, Seehwa Jeong and Cheol Seong Hwang Metal-organic Chemical Vapor Deposition of PZT Thin Films with Different Precursor Solution for Mass-Production Compatibility MRS 2002 fall meeting, Boston, Ma, USA, Dec 2 (2002)
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16 |
Cheol Seong Hwang, and Jin Shi-Zhao Low temperature MOCVD of PZT thin films for FeRAM applications MRS 2002 fall meeting, Boston, Ma, USA, Dec 2 (2002)
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15 |
¹Ú¿ì¿µ, ¾È°ÇÈ£, Ȳö¼º On-axis¿Í off-axis ¹æ½Ä rf ¸¶±×³×Æ®·Ð ½ºÆÛÅ͸µ¹ýÀ¸·Î ÁõÂøµÈ (Ba, Sr)TiO3 ÃàÀü¹Ú¸·¿¡¼ÀÇ Àü±âÀû ¹°¼º¿¡ ´ëÇÑ ½ºÆ®·¹½º ¿µÇâ Çѱ¹Àç·áÇÐȸ, ´ëÀü ¹èÁ¦´ë, 2002³â 11¿ù 1ÀÏ
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14 |
Á¶¹®ÁÖ, ¹ÚÈ«¹è, ¹ÚÀçÈÄ, Ȳö¼º Hf[(CH3)2]4 precusor¸¦ ÀÌ¿ëÇÑ HfO2 ¹Ú¸·ÀÇ ¼ºÀå±â±¸¿Í Àü±âÀû ¼ºÁú¿¡ °üÇÑ °íÂû Çѱ¹Àç·áÇÐȸ, ´ëÀü ¹èÁ¦´ë, 2002³â 11¿ù 1ÀÏ
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13 |
¹ÚÀçÈÄ, Á¶¹®ÁÖ, ¹ÚÈ«¹è, Ȳö¼º Hf(MMP)4 ¿ø·á ¹°ÁúÀ» ÀÌ¿ëÇؼ ÁõÂøÇÑ MOCVD HfO2 ¹Ú¸·ÀÇ Æ¯¼º ºÐ¼® Çѱ¹Àç·áÇÐȸ, ´ëÀü ¹èÁ¦´ë, 2002³â 11¿ù 1ÀÏ
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12 |
±Ç¿À¼º, ±è¼º±Ù, Ȳö¼º, Á¤ÀçÇÐ, Çö±¤¼ö H2O plasma¸¦ ÀÌ¿ëÇÑ SrTiO3 Atomic Layer Deposition Çѱ¹Àç·áÇÐȸ, ´ëÀü ¹èÁ¦´ë, 2002³â 11¿ù 1ÀÏ
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11 |
ÀÓÁöÀº, ¹Úµ¿¿¬, Á¤Àç°æ, ¾È°ÇÈ£, ±èÇüÁØ, Ȳö¼º Sol-gel ¹ýÀ¸·Î ÁõÂøµÈ Pb(Zr,Ti)O3 ¹Ú¸·ÀÇ °À¯Àü Ư¼º¿¡ ¹ÌÄ¡´Â Pt ÇϺÎÀü±Ø µÎ²² ¿µ Çѱ¹Àç·áÇÐȸ, ´ëÀü ¹èÁ¦´ë, 2002³â 11¿ù 1ÀÏ
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