| 40 |
Gun Hwan Kim, Woo Young Park, Kyung Min Kim, Joon Young Seok, Seul Jie Song, Cheol Seong Hwang Schottky diodes for excluding the sneak current in cross bar array resistive memory 10th Annual Non-Volatile Memory Technology Symposium (NVMTS 2009), Portland, Oregon, October 25-28 (2009)
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| 39 |
Seul Ji Song, Kyung Min Kim, Gun Hwan Kim, Jun Young Seok, Ranju Jung, Cheol Seong Hwang The capacitive charge effect on the on-state resistance of a TiO2 resistive memory 10th Annual Non-Volatile Memory Technology Symposium (NVMTS 2009), Portland, Oregon, October 25-28 (2009)
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| 38 |
Kyung Min Kim, Gun Hwan Kim, Seul Ji Song, Joon Young Seok and Cheol Seong Hwang The conical shape filament growth model in unipolar resistance switching of TiO2 thin film 10th Annual Non-Volatile Memory Technology Symposium (NVMTS 2009), Portland, Oregon, October 25-28 (2009)
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| 37 |
S. Won, M. Huh, S. Park, S. Seo, Y. Choi, J. Heo, C. Hwang and H. Kim Interface Analysis of Transparent Analog Capacitor Using ITO Electrodes and ALD High-k Dielectrics 216th ECS Meeting, Vienna, Austria, October 4-9 (2009), Oral
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| 36 |
M. Huh, B. Yang, S. Oh, S. Won, J. Jeong, C. Hwang and H. Kim Improvement in the Device Characteristics of Tin Oxide Thin-film Transistors by Adopting Ultralow-Pressure Sputtering 216th ECS Meeting, Vienna, Austria, October 4-9 (2009), Oral
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| 35 |
Kyung Min Kim and Cheol Seong Hwang The Conical Shape Filament Growth Model in Unipolar Resistance Switching of TiO2 Thin Film 216th ECS Meeting, Vienna, Austria, October 4-9 (2009), Oral
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| 34 |
An Quan Jiang, Hyun Ju Lee, Gun Hwan Kim, Min Hyuk Park and Cheol Seong Hwang Unusual improvement in the functionality of ferroelectric films by using the inlaid Al2O3 tunnel switch layer IMF-ISAF 2009, Xi'an, China, August 23-26 (2009) |
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| 33 |
Min Hyuk Park, Hyun Ju Lee, Gun Hwan Kim, and Cheol Seong Hwang The effect of periodic relaxation on the growth behavior and electrical properties of atomic layer deposited PbTiO3 thin film IMF-ISAF 2009, Xi'an, China, August 23-26 (2009), Oral
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| 32 |
Hyun Ju Lee, Min Hyuk Park, and Cheol Seong Hwang The effect of oxidants on the growth behavior of PbTiO3 thin film by atomic layer deposition IMF-ISAF 2009, Xi'an, China, August 23-26 (2009), Oral
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| 31 |
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Un Ki Kim, Sang Young Lee, Joohwi Lee, Hyung Suk Jung, Kwang Duk Na, and Cheol Seong Hwang Improved growth behavior and electrical properties of ALD HfO2 film using discrete feeding method (DFM) of metal-organic precursor ALD 2009, Monterey, California, July 19-22 (2009), Poster
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