| 36 |
Cheol Seong Hwang, Hyun Ju Lee, Gyu Weon Hwang, Keun Lee Atomic-Layer-Deposition of Ferroelectric Pb(Zr,Ti)O3 thin films and their applications German Celebrations by The Alexander von Humbolt Kolleg, Cambridge University, UK, October 20-28 (2006) |
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| 35 |
Cheol Seong Hwang Ferroelectric Thin Film Processing and Integration 18th International Symposium on Integrated Ferroelectrics, Waikiki Hotel, Hawaii, April 23 (2006) |
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| 34 |
Sang Woon Lee, Gyu Weon Hwang, Jeong Hwan Hahn, and Cheol Seong Hwang Understanding the atomic-layer-deposition mechanism for multi-component high dielectric SrTiO3 and ferroelectric PbTiO3 thin films AVS Special symposium on Atomic Layer Deposium 2006, Kyoyukmunhwahoikwan, Seoul, July 24 (2006) |
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| 33 |
Keun Lee, Hyun Ju Lee, Jin Shi Zhao, Joon Seop Sim, and Cheol Seong Hwang Ferroelectric and reliability properties of metal-organic chemical vapor deposited Pb(Zr0.15Ti0.85)O3 thin films grown in the self-regulation process window The 6th Japan-Korea Conference on Ferroelectrics (JKC-FE06), Tohoku Univ., Sendai, Japan, August 17-20 (2006) |
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| 32 |
Hyun Ju Lee, Gyu Weon Hwang, Keun Lee, and Cheol Seong Hwang Atomic-layer-deposition of ferroelectric thin films 5th Asian meeting on Ferroelectrics, Tokyo University of Science, Japan, September 3-5 (2006) |
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| 31 |
Yong Cheol Shin, Byung Joon Choi, Kyung-Min Kim, Sul Choi, and Cheol Seong Hwang Analysis of Resistive Switching of TiO2 using Conductive Atomic Force Microscopy The 6th Japan-Korea Conference on Ferroelectrics (JKC-FE06), Tohoku Univ., Sendai, Japan, August 17-20 (2006) |
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| 30 |
Hyun Ju Lee, Seong Keun Kim, Keun Lee, Byung Joon Choi, and Cheol Seong Hwang Characterization on the ferroelectroc properties of series capacitors consisted of Pb(Zr,Ti)O3 and Al2O3 films The 6th Japan-Korea Conference on Ferroelectrics (JKC-FE06), Tohoku Univ., Sendai, Japan, August 17-20 (2006) |
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| 29 |
Minha Seo, Seong Keun Kim, Kyung-Min Kim, Cheol Seong Hwang Crystallization and electrical properties of atomic layer depositied HfO2 films using Hf([N(CH3)(C2H5)]3[OC(CH3)3]) and O3 The 6th Japan-Korea Conference on Ferroelectrics (JKC-FE06), Tohoku Univ., Sendai, Japan, August 17-20 (2006) |
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| 28 |
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo and Cheol Seong Hwang Correlation between high-k properties and interfacial chemical structure of ALD HfO2 thin films on Si, Si1-xGex and Ge substrates The Electrochemical Society 210th meeting, Moon Palace Resorts, Cancun, Mexico, October 26–November 3 (2006) |
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| 27 |
Kyung Min Kim, Byung Joon Choi, Bon Wook Koo, Seol Choi, Cheol Seong Hwang Resistive Switching in Pt/Al2O3/TiO2/Ru Stacked Structures The Electrochemical Society 210th meeting, Moon Palace Resorts, Cancun, Mexico, October 26–November 3 (2006), Poster |
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