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B. J. Choi, D. S. Jung, S. K. Kim, S. Choi, J. H. Oh, C. Rohde, H. J. Kim, C. S. Hwang, R. Waser, B. Reichenberg, S. Tiedke

Resistive switching mechanism of TiO2 thin films grown by atomic-layer-deposition

Juelich Nanoelectronics Days, Juelich, Germany, February 9-12 (2005)
42

Cheol Seong Hwang and Doo Seok Jeong

Current transport mechanism through high-k HfO2 films on Si

17th International Symposium on Integrated Ferroelectrics, Shanghai, China, April 17-20 (2005)
41

Cheol Seong Hwang, Woo Young Park, Choong Bae Joen, Mathias Schindler, and Doo Seok Jeong

Film thickness dependent dielectric properties and Curie-Weiss behavior of (Ba,Sr)TiO3 thin film capacitors

2nd International conference on electroceramics., KIST, Korea, Junary 13 (2005)
40

Cheol Seong Hwang

Resistive switching in TiO2 thin films

Japan-Korea special symposium on “Evolution and Outlook of Oxide Nonvolatile memories”, Nihon Univ. Tokyo, Japan, December 11 (2005)
39

Hyun Ju Lee, Jin Shi Zhao, Joon Seop Sim,  Dong Yeon Park and Cheol Seong Hwang

Characterization of PbxPty alloy formation during deposition of Pb(Zr,Ti)O3 thin films by liquid delivery metal-organic chemical vapor deposition

2005 MRS fall meeting, Hynes Convention Center & Sheraton Boston Hotel, Boston, MA, November 28-December 2 (2005)
38

Joon Seop Sim, Jin Shi Zhao, Hyun Ju Lee, Woo Young Park and Cheol Seong Hwang

Growth characteristics of metal-organic chemical vapor deposited Pb(Zr,Ti)O3 fimls ono SrRuO3 electrodes

2005 MRS fall meeting, Hynes Convention Center & Sheraton Boston Hotel, Boston, MA, November 28-December 2 (2005)
37

Tae Joo Park, Seong Keun Kim, Jeong Hwan Kim, Jaehoo Park, Moonju Cho, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang

Electrical properties of high-k HfO2 films on Si1-xGex substrates

14th bi-annual conference on Insulating Films on Semiconductors (INFOS 2005), IMEC, Belgium, June 22-23 (2005)
36

Sun Hee Choi, Woo Sik Kim, Ji-Won Son, Jong-Ho Lee, Hae-Weon Lee Cheol Seong Hwang and Joosun Kim

Fabrication and Characterization of the Thin Film Electrolyte for Integrated On-plane Type Micro-SOFCs

Second International Conference on Flow Dynamics, Sendai, Japan, November 16-18 (2005)
35

S. K. Kim, K. M. Kim, C. S. Hwang

Atomic layer deposition of titanium oxide thin films using O3 for MIM capacitor of next generation memory devices

AVS 52nd International Symposium & Exhibition, Hynes convention center, Boston, MA, USA, October 30-November 4 (2005)
34

O. S. Kwon, S. W. Lee, C. S. Hwang

Atomic layer deposition of SrTiO3 films having a high thickness- and cation-composition confirmality over a severe contact hole structure

AVS 52nd International Symposium & Exhibition, Hynes convention center, Boston, MA, USA, October 30-November 4 (2005)