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30

Sang Woon Lee, Jeong Hwan Han and Cheol Seong Hwang

Improved Growth Characteristics of Strontium Titanate Thin Film Grown By Atomic Layer Deposition using Sr(iPr3Cp)2

ALD 2009, Monterey, California, July 19-22 (2009), Oral

29

Gyu-Jin Choi, Seong Keun Kim, Sang Young Lee, Woo Young Park, Minha Seo, Byung Joon Choi, and Cheol Seong Hwang

Impact of Ru buffer layer growth on TiN electrode on TiO2 dielectric films grown by atomic layer deposition for capacitor applications

ALD 2009, Monterey, California, July 19-22 (2009), Oral

28

Jeong Hwan Han, Sang Woon Lee, Gyu-Jin Choi and Cheol Seong Hwang

Pulsed chemical vapor deposition of Ruthenium dioxide thin films Using RuO4 precursor for the DRAM capacitor electrode

ALD 2009, Monterey, California, July 19-22 (2009), Poster

27

Jeong Hwan Kim, Tae Joo Park, Jae Hyuck Jang, Un Ki Kim, Hyung Suk Jung, Sang Young Lee, Minha Seo, Joohwi Lee, Him Chan Oh, and Cheol Seong Hwang

Electrical properties and chemical analysis of Hafnium oxide thin films deposited by ALD at very low temperature (¡Â100oC)

ALD 2009, Monterey, California, July 19-22 (2009), Poster

26

Byung Joon Choi, Taeyong Eom, Seol Choi, and Cheol Seong Hwang

Plasma enhanced atomic layer deposition of GeSbTe films using NH3 reduction gas

ALD 2009, Monterey, California, July 19-22 (2009), Oral

25

H. Lee, M. Park and C. Hwang

The Effects of Oxidants on the Growth Behavior of PbTiO3 Thin Film by Atomic Layer Deposition

215th ECS meeting, San Francisco, CA, May 24-29 (2009), Poster

24

M. Park, H. Lee, G. Kim and C. Hwang

The Effect of Periodic Relaxation on the Growth Behavior and Electrical Properties of Atomic Layer Deposited PbTiO3 Thin film

215th ECS meeting, San Francisco, CA, May 24-29 (2009), Poster

23

J. Han, S. Lee, G. Choi, S. Lee, C. Hwang, C. Dussarrat and J. Gatineau

Pulsed-Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Thin Films using RuO4 Precursor for the DRAM Capacitor Electrode

215th ECS meeting, San Francisco, CA, May 24-29 (2009), Oral

22

S. Lee, J. Han and C. Hwang

Improved Growth Behaviors of SrTiO3 Thin films Using the Optimized Seed Layer deposited by Atomic Layer Deposition

215th ECS meeting, San Francisco, CA, May 24-29 (2009), Oral

21

G. Choi, J. Han, S. Lee, S. Kim, and C. Hwang

A Mass-production Compatible Capacitor Technology for DRAMs with Design Rule Down to 20nm

215th ECS meeting, San Francisco, CA, May 24-29 (2009)