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46

Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Sang Young Lee, Hyung Suk Jung, Miyoung Kim, Cheol Seong Hwang, Gee-Man Kim, Kang Jun Choi, Jae Ho Choi, Jae Hak Jeong

Structural Evolution and Electrical Properties of Al-Doped ALD HfO2 Thin Films and PEALD TaCxNy Metal Gate

IWDTF 2008, Tokyo Institute of Technology, November 5-7 (2008)

45

Hyung-Suk Jung, Tae Joo Park, Jeong Hwan Kim, Sang Young Lee, Kwang Duck Na, Jung-Min Park, Weon-Hong Kim, Min-Woo Song, Nae-In Lee, Cheol Seong Hwang

Systematic Study on Bias Temperature Instability of Various Hf-Based Oxides ; HfO2, (Hf,Al)Oy and (Hf,Zr)Oz

IWDTF 2008, Tokyo Institute of Technology, November 5-7 (2008)

44

Bong Sop Yang, Myung Soo Huh, Jae Won Song, Cheol Seong Hwang, Hyeong Joon Kim

Influence of low-pressure process and rapid thermal annealing treatment on the electrical property of Al2O3/SnO2 MIS capacitor

2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008)

43

Kwang Duk Na, Tae Joo Park, Jaewon Song, Jeong Hwan Kim, Cheol Seong Hwang, Sung Min Yoon, Sang-Hee Ko Park, Chi-Sun Hwang

Effect of pre-deposition and post-deposition annealing of HfO2 on ZnO for transparent metal-insulator-semiconductor gate stack

2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008)

42

Deok-Yong Cho, Jaewon Song, Cheol Seong Hwang, W S Choi, T W Noh

Electronic structure of amorphous InGaO3(ZnO)0.3 thin films

2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008)

41

Jeong Hwan Kim, Tae Joo Park, Kwang Duk Na, Myung soo Huh, Bong Sop Yang, Hyeong Joon Kim and Cheol Seong Hwang

Influence of pre-deposition annealing and ozone treatment on the electrical property of HfO2/SnO2 MIS capacitor

2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008)

40

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Investigation on Ge doping effect in Sb rich SbxTe1-x(x>0.5) thin films deposited by PECVD

´ëÇѱݼÓÀç·áÇÐȸ 2008³âµµ Ãß°èÇмú´ëȸ, ¼ÛµµÄÁº¥½Ã¾Æ, 2008³â 10¿ù 23ÀÏ-24ÀÏ

39

ÃÖº´ÁØ, ÃÖ¼³, ¾öÅ¿ë, Ȳö¼º, ±èÀ±Á¤, È«¼®°æ

Influence of substrates on the growth of Ge2Sb2Te5 films by combined atomic-layer- and chemical-vapor-deposition

´ëÇѱݼÓÀç·áÇÐȸ 2008³âµµ Ãß°èÇмú´ëȸ, ¼ÛµµÄÁº¥½Ã¾Æ, 2008³â 10¿ù 23ÀÏ-24ÀÏ

38

Ȳö¼º, ÃÖº´ÁØ, ÃÖ¼³, ¾öÅ¿ë, ±èÀ±Á¤, È«¼®°æ

Plasma enhanced atomic layer deposition of Ge2Sb2Te5 films and its applications to phase change memory

´ëÇѱݼÓÀç·áÇÐȸ 2008³âµµ Ãß°èÇмú´ëȸ, ¼ÛµµÄÁº¥½Ã¾Æ, 2008³â 10¿ù 23ÀÏ-24ÀÏ

37

S. K. Kim, K. J. Choi, and C. S. Hwang

Dielectric and Electrode Thin Films for Stack-Cell Structured DRAM Capacitors with sub 50-nm Design Rules

The 6th Asian Meeting on Ferroelectrics, National Taipei University of Technology, Taipei, Taiwan, August 2-6 (2008)