| 43 |
Cheol Seong Hwang, Hyun Ju Lee, An Quan Jiang, Gun Hwan Kim, and Min Hyuk Park Understanding of ferroelectric switching of the ultra-thin Pb(Zr,Ti)O3 thin films using the inlaid Al2O3 tunnel switch layer JKC-FE08, Himeji, Japan, August 4 (2010)
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| 42 |
Joohwi Lee, Kwand Duk Na, Jung-Hae Choi, Seung-Cheol Lee, Tomofumi Tada, Satoshi Watanabe, Cheol Seong Hwang Formation and migration of a vacancy in Ge under biaxial compressive strain by first-principles calculations Psi-k Conference 2010, Berlin, Germany, September 12-16 (2010), Poster
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| 41 |
C. S. Hwang, K. M. Kim, D. H. Kwon, J. H. Jang, J. M. Jeon, M. H. Lee, S. J. Song, G. H. Kim, J. Y. Seok, B. Lee, S. Han, and M. Kim Microscopic identity of the conducting nano-filaments in resistance switching TiO2 thin film and transition kinetics The 7th AMF-AMEC 2010, Jeju, Korea, June 28-July 1 (2010)
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| 40 |
M. H. Park, H. J. Lee, Y. J. Kim, and C. S. Hwang Ferroelectric Properties of Pt/Pb(Zr, Ti)O3/Al2O3/ZnO/Pt Stack Capacitors for Nonvolatile Memory Applications The 7th AMF-AMEC 2010, Jeju, Korea, June 28-July 1 (2010)
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| 39 |
Hyun Ju Lee, Gun Hwan Kim, Min Hyuk Park, Yu Jin Kim, and Cheol Seong Hwang Study on the charge injection for the polarization reversal in the Pt/Pb(Zr,Ti)O3/Pt and Pt/Al2O3/Pb(Zr,Ti)O3/Pt ferroelectric capacitors The 7th AMF-AMEC 2010, Jeju, Korea, June 28-July1 (2010)
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| 38 |
Hyung-Suk Jung, Hyo Kyeom Kim, Jeong Hwan Kim, Sang Young Lee, Joohwi Lee, Cheol Seong Hwang, Jung-Min Park, Weon-Hong Kim, Min-Woo Song, and Nae-In Lee The effect on nitrogen in in-situ PEALD grown HfOxNy gate dielectrics on electrical and bias temperature instability characteristics ALD 2010, Seoul, June 21-23 (2010), Poster
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| 37 |
Jeong Hwan Han, Sang Woon Lee, Seong Keun Kim, Sora Han, Cheol Seong Hwang, Christian Dussarrat, and Julien Gatineau Pulsed chemical vapor deposition of RuO2 films and electrical performance of ALD TiO2 film on the RuO2 electrode ALD 2010, Seoul, June 21-23 (2010), Poster
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| 36 |
Amandine Bassou-Pizzagalli, Sang Woon Lee, Jeong Hwan Han, Cheol Seong Hwang, and Julien Gatineau Development of an ALD-like SrRuxOy Low Temperature Process ALD 2010, Seoul, June 21-23 (2010), Poster
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| 35 |
Sora Han, Jeong Hwan Han, Seong Keun Kim, Sang Woon Lee, Minha Seo, and Cheol Seong Hwang Characterization of ALD Al-doped TiO2 films on ultrathin Ru buffered TiN layer for application to sub-30 nm DRAM capacitor ALD 2010, Seoul, June 21-23 (2010), Poster
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| 34 |
Seong Keun Kim, Jeong Hwan Han, Gun Hwan Kim, and Cheol Seong Hwang Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition ALD 2010, Seoul, June 21-23 (2010), Poster
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