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T. Eom, S. Choi, B.J.Choi, S.Rha, W. Lee, C.S. Hwang, and M. S. Kim Atomic layer deposition of (GeTe2)x(Sb2Te3)y films using novel precursors 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Poster
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M.H.Park, H.J.Lee, and C.S.Hwang Ferroelectric properties of Pt/Pb(Zr,Ti)O3/Al2O3/ZnO/Pt stack capacitors for nonvolatile memory application 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Poster
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| 11 |
H.J.Lee, G.H.Kim, M.H.Park, and C. S. Hwang Polarization reversal in the Pt/Pb(Zr,Ti)O3/Pt and Pt/Al2O3/Pb(Zr,Ti)O3/Pt ferroelectric capacitors 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 10 |
J.H. Han, S. W. Lee, S. K. Kim, and C. S. Hwang Pulse CVD of RuO2 thin films using a noble Ru precursor for memory application 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 9 |
S. Y. Lee, H. S. Jung, Y.J. Choi, J.H. Kim, J. Lee, U.K.Kim, S.J. Won, and C.S. Hwang The effect of ALD growth La2O3 layer on Vfb modulation of HfO2, ZrO2, and HfZrOx high-k films 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 8 |
S. J. Song, K. M. Kim, G.H.Kim, J.Y.Seok, R. Jung, and C. S. Hwang Influence of the capacitive charge on the set-state resistance in TiO2 resistive switching memory 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 7 |
S. W. Lee, J. H. Han, S. R. Han, and C. S. Hwang Improved growth characteristics of SrTiO3 thin films deposited by Atomic Layer Deposition using Sr(iPr3Cp)2 and Ti(O-iPr)2(thd)2 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 6 |
Choi, B. J. Choi, T. Eom, S. Rha, W. Lee, and C. S. Hwang Growth and crystallization behaviors of Ge doped Sb-Te thin films deposited bt a combined plasma enhanced CVD and ALD 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 5 |
M. H. Lee, K. M. Kim, J.H. Yoon, and C. S. Hwang Impedance spectroscopy observation for examining resistive switching mechanism in TiO2 thin films 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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| 4 |
G. H. Kim, J. Y. Seok, K.M. Kim, and C.S. Hwang Influence of electrode material on the interconnect line resistance and performance of resistive cross bar array 제 17회 한국 반도체 학술대회, 호텔 인터불고 엑스코, February 24~26 (2010), Oral
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