Cheol Seong Hwang

Ferroelectric fluorite structured oxides: Materials fundamentals,
switching, wake- up, and applications in electronics and energy

48^th IEEE Semiconductor Interface Specialist Conference (SISC 2017),San Diego, US, Dec 6^th-9^th, 2017, Invited

Cheol Seong Hwang

ALD of high-k dielectric films for DRAM capacitors: O₃ and other oxygen sources

제56회 한국진공학회 동계정기학술대회, 강원도 홍천 대명비발디파크, 2월 18-20일, 2019, invited

Cheol Seong Hwang

Ferroelectric (Hf, Zr) O2 Films

PRiME 2016, Honolulu, HI, October 2-7, 2016, invited

Min Hyuk Park and Cheol Seong Hwang

Phase Transition and Related Energy applications of (Hf,Zr)O₂ Films

ECS Biannual Meetings 231st ECS Metting, New Orleans, LA, May 28-June 1, 2017, invited

Nuo Xu, Xinglong Shao, Kyung Jean Yoon, Hae Jin Kim, Kyung Min Kim, and Cheol Seong Hwang

Stateful logic circuit and material using memristors

Novel high-k Application Workshop 2017, Dresden, Germany, Mar. 9th, invited

Yu Jin Kim, Min Hyuk Park, Hyeon Woo Park, and Cheol Seong Hwang

Emergence and frustration of negative capacitance effect in dielectric/ferroelectric bi-layers

Novel high-k Application Workshop 2017, Dresden, Germany, Mar. 9th, invited

Nuo Xu, Xinglong Shao, Kyung Jean Yoon, Hae Jin Kim, Kyung Min Kim, and Cheol Seong Hwang

Stateful logic circuit and material using memristors

Electron Devices Technology and Manufacturing Conference (EDTM 2017), Toyama, Japan, Feb 28th, invited

Yu Jin Kim, Min Hyuk Park, and Cheol Seong Hwang

Negative capacitance: theory, practice and limitations

ISAF/ECAPD/PFM Conference 2016, Darmstadt, August 21-25, 2016, invited

Cheol Seong Hwang

Prospect of Semiconductor Memory Devices: from Memory System to Materials

1st International Symposium on Emerging Functional Materials, 송도 컨벤시아, November 4-6 (2015), Invited