| 30 |
Cheol Seong Hwang Resistive switching in TiO2 thin films; a detailed model for the filamentary switching The 14th International Workshop on Oxide Electronics, Jeju island, Korea, October 7-10 (2007), Invited |
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| 29 |
Cheol Seong Hwang, Seong Keun Kim , Kyu Jin Choi Dielectric and electrode thin films for stack-cell structured DRAM capacitors with sub 50-nm design rules The 2007 E-MRS Fall Meeting, Warsaw University of Technology, Poland, Sep 17-20 (2007), Invited
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| 28 |
Cheol Seong Hwang, Hyun Ju Lee, Gyu Weon Hwang, Keun Lee Atomic-Layer-Deposition of Ferroelectric Pb(Zr,Ti)O3 thin films and their applications German Celebrations by The Alexander von Humbolt Kolleg, Cambridge University, UK, October 20-28 (2006), Invited |
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| 27 |
Cheol Seong Hwang High-k capacitor and recent DRAM technology; Scaling of DRAM MOSFETs and Capacitors 16th International Symposium on Integrated Ferroelectrics, Gyeongju, Korea, April 5-9 (2004), Tutorial lecture, Invited |
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| 26 |
B. J. Choi, D. S. Jung, S. K. Kim, S. Choi, J. H. Oh, C. Rohde, H. J. Kim, C. S. Hwang, R. Waser, B. Reichenberg, S. Tiedke Resistive switching mechanism of TiO2 thin films grown by atomic-layer-deposition Juelich Nanoelectronics Days, Juelich, Germany, February 9-12 (2005), Invited |
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| 25 |
Cheol Seong Hwang and Doo Seok Jeong Current transport mechanism through high-k HfO2 films on Si 17th International Symposium on Integrated Ferroelectrics, Shanghai, China, April 17-20 (2005), Invited |
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| 24 |
Cheol Seong Hwang, Woo Young Park, Choong Bae Joen, Mathias Schindler, and Doo Seok Jeong Film thickness dependent dielectric properties and Curie-Weiss behavior of (Ba,Sr)TiO3 thin film capacitors 2nd International conference on electroceramics., KIST, Korea, Junary 13 (2005), Invited |
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| 23 |
Cheol Seong Hwang Ferroelectric Thin Film Processing and Integration 18th International Symposium on Integrated Ferroelectrics, Waikiki Hotel, Hawaii, April 23 (2006), Invited |
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| 22 |
Sang Woon Lee, Gyu Weon Hwang, Jeong Hwan Hahn, and Cheol Seong Hwang Understanding the atomic-layer-deposition mechanism for multi-component high dielectric SrTiO3 and ferroelectric PbTiO3 thin films AVS Special symposium on Atomic Layer Deposium 2006, Kyoyukmunhwahoikwan, Seoul, July 24 (2006), Invited |
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| 21 |
Keun Lee, Hyun Ju Lee, Jin Shi Zhao, Joon Seop Sim, and Cheol Seong Hwang Ferroelectric and reliability properties of metal-organic chemical vapor deposited Pb(Zr0.15Ti0.85)O3 thin films grown in the self-regulation process window The 6th Japan-Korea Conference on Ferroelectrics (JKC-FE06), Tohoku Univ., Sendai, Japan, August 17-20 (2006), Invited |
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