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60

Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Woongkyu Lee, Taehwan Moon, and Cheol Seong Hwang

Ferroelectricity in HfO2-based films

Electroceramics XIV, Bucharest Romania, June 16-20 (2014), Invited

59

Yu Jin Kim, Min Hyuk Park, Han Joon Kim, Doo Seok Jeong, Cheol Seong Hwang

Negative capacitance in ferroelectric oxides

CECAM-Workshop Functional oxides for emerging technologies, Bremen University, Bremen, Germany, October 14-18 (2013), Invited

58

Cheol Seong Hwang

Unusual ALD behaviors in oxides and chalcogenides

ALD, San Diego Marriott Marquis & Marina, San Diego, United States, July 28-31 (2013), Invited

57

Cheol Seong Hwang, Sang Woon Lee, Byung Joon Choi, Taeyong Eom, Jeong Hwan Han, Seong Keun Kim, Seul Ji Song, and Woongkyu Lee

Uncommon aspects of atomic layer deposition processes for the growth of functional electronic materials

NIMS Conference, Japan, July 1-3 (2013), Invited

56

Cheol Seong Hwang

Challenges of ALD for future memory applications

E-MRS, May 28 (2013), Invited

55

Cheol Seong Hwang

Negative Capacitance in Ferroelectric/Dielectric Layers

MRS, April 3 (2013), Invited

54

Cheol Seong Hwang

Atomic layer deposition for microelectronic devices

Nature Conference 2012, Aachen, Germany, June 17-20 (2012), Invited

53

Woongkyu Lee, Jeong Hwan Han, Woojin Jeon, and Cheol Seong Hwang

Recent Progress and current status of dielectrics for DRAM

WoDiM, Dresden, Germany, June 25-27 (2012), Invited

52

Taeyong Eom, Taehong Gwon, Sijung Yoo, Moo-Sung Kim, Manchao Xiao, lain Buchanan, and Cheol Seong Hwang

Atomic layer deposition of (GeTe2)(1-x)(Sb2Te3)x pseudo-binary layers for phase change memories

ALD 2012, Dresden, Germany, June 17-20 (2012), Invited

51

M. H. Park, Y. J. Kim, and C. S. Hwang

Is there a negative capacitance?

Á¦8Â÷ °­À¯Àüü ¿¬ÇÕ ½ÉÆ÷Áö¾ö, ¹«ÁÖ, 2012³â 2¿ù 12ÀÏ-14ÀÏ, Invited