60 |
Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Woongkyu Lee, Taehwan Moon, and Cheol Seong Hwang Ferroelectricity in HfO2-based films Electroceramics XIV, Bucharest Romania, June 16-20 (2014), Invited |
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59 |
Yu Jin Kim, Min Hyuk Park, Han Joon Kim, Doo Seok Jeong, Cheol Seong Hwang Negative capacitance in ferroelectric oxides CECAM-Workshop Functional oxides for emerging technologies, Bremen University, Bremen, Germany, October 14-18 (2013), Invited |
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58 |
Cheol Seong Hwang Unusual ALD behaviors in oxides and chalcogenides ALD, San Diego Marriott Marquis & Marina, San Diego, United States, July 28-31 (2013), Invited |
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57 |
Cheol Seong Hwang, Sang Woon Lee, Byung Joon Choi, Taeyong Eom, Jeong Hwan Han, Seong Keun Kim, Seul Ji Song, and Woongkyu Lee Uncommon aspects of atomic layer deposition processes for the growth of functional electronic materials NIMS Conference, Japan, July 1-3 (2013), Invited |
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56 |
Cheol Seong Hwang Challenges of ALD for future memory applications E-MRS, May 28 (2013), Invited |
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55 |
Cheol Seong Hwang Negative Capacitance in Ferroelectric/Dielectric Layers MRS, April 3 (2013), Invited |
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54 |
Cheol Seong Hwang Atomic layer deposition for microelectronic devices Nature Conference 2012, Aachen, Germany, June 17-20 (2012), Invited
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53 |
Woongkyu Lee, Jeong Hwan Han, Woojin Jeon, and Cheol Seong Hwang Recent Progress and current status of dielectrics for DRAM WoDiM, Dresden, Germany, June 25-27 (2012), Invited |
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52 |
Taeyong Eom, Taehong Gwon, Sijung Yoo, Moo-Sung Kim, Manchao Xiao, lain Buchanan, and Cheol Seong Hwang Atomic layer deposition of (GeTe2)(1-x)(Sb2Te3)x pseudo-binary layers for phase change memories ALD 2012, Dresden, Germany, June 17-20 (2012), Invited |
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51 |
M. H. Park, Y. J. Kim, and C. S. Hwang Is there a negative capacitance? Á¦8Â÷ °À¯Àüü ¿¬ÇÕ ½ÉÆ÷Áö¾ö, ¹«ÁÖ, 2012³â 2¿ù 12ÀÏ-14ÀÏ, Invited |
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