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11

Y Min, Y. J. Cho, J. Han, W. D. Kim, and C. S. Hwang

Characterization and Electrical Properties of Bi1-x-yTixSiyOz(BTSO) Thin Films by Atomic Layer Deposition

The 16th International Symposium on Integrated Ferroelectrics, Hotel Hyundai Gyeongju, Bomun Lake Resort, Gyeongju, Korea, April 5-8 (2004), Poster

10

Oh Seong Kwon, Moon Ju Cho and Cheol Seong Hwang, and Jae Hack Jeong

Atomic Layer Depositon of SrTiO3 Films Having a High Thickness- and cation - composition Conformality Over a Severe Contact Hole Structure

The 16th International Symposium on Integrated Ferroelectrics, Hotel Hyundai Gyeongju, Bomun Lake Resort, Gyeongju, Korea, April 5-8 (2004)

9

S. K. Kim and C. S. Hwang

Variations in the Electrical Properties of Atomic-Layer-Deposited Al2O3 Thin Films by Various Pre-Oxidation Treatments of the Si Substrates

The 16th International Symposium on Integrated Ferroelectrics, Hotel Hyundai Gyeongju, Bomun Lake Resort, Gyeongju, Korea, April 5-8 (2004)

8

M. Cho, J. Park, H. B. Park, S. W. Lee, C. S. Hwang, J. Jeong, and G. H. Jang

High-K Properties of Atomic-Layer-Deposited HfO2 Films Using a Nitrogen-Containing Hf[N(CH3)2]4 Precursor and H2O or O3 Oxidant

The 16th International Symposium on Integrated Ferroelectrics, Hotel Hyundai Gyeongju, Bomun Lake Resort, Gyeongju, Korea, April 5-8 (2004)

7

Cheol Seong Hwang

High-k capacitor and recent DRAM technology; Scaling of DRAM MOSFETs and Capacitors

16th International Symposium on Integrated Ferroelectrics, Gyeongju, Korea, April 5-9 (2004), Tutorial lecture

6

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Analysis of the nitrogen incorporation by N2O oxidant on HfxAlyOz gate dielectric films grown by chemical vapor deposition using a single molecular precursor

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5

±è¼º±Ù, Ȳö¼º

The study on the electrical properties of Al2O3 thin films on O3 oxidation of Si substrate

Á¦11ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ¹«ÁÖ¸®Á¶Æ® È£ÅÚƼ·Ñ, 2004³â 2¿ù 19ÀÏ-20ÀÏ, Poster

4

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Fabrication of the Capacitive Probe and Study on the C-V characterization

Á¦11ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ¹«ÁÖ¸®Á¶Æ® È£ÅÚƼ·Ñ, 2004³â 2¿ù 19ÀÏ-20ÀÏ

3

Á¶±Ý¼®, ¹Úµ¿¿¬, Ȳö¼º

»õ·Î¿î Àü±¸Ã¼¸¦ »ç¿ëÇÑ Pb(Zr, Ti)O3 ¹Ú¸·ÀÇ Àú¿Â À¯±âÈ­ÇÐ ÁõÂø

Á¦11ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ¹«ÁÖ¸®Á¶Æ® È£ÅÚƼ·Ñ, 2004³â 2¿ù 19ÀÏ-20ÀÏ

2

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Atomic layer doposition of SrTiO3 films with remote-plasma activated H2O and conventional metal organic precursors

Á¦11ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ¹«ÁÖ¸®Á¶Æ® È£ÅÚƼ·Ñ, 2004³â 2¿ù 19ÀÏ-20ÀÏ