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41

Gyu Weon Hwang, Wan Don Kim, Cheol Seong Hwang, Yo-Sep Min, Young Jin Cho, Jeong-Hee Han

Atomic Layer Deposition of Bi2Ti2O7 Thin Films for Capacitor Dielectric Applications

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40

Cheol Seong Hwang

Fabrication of a MOS type micro capacitive tip array using SiO2 or HfO2 gate insulators

The 4th Innovative Mass Storage Technologies Workshop, Dorint Aachen Quellenhof Hotel, Aachen, Germany, September 28-29 (2004)

39

Sang Yeol Kang, Beom Seok Kim, Sang Yong No, Jung-Hae Choi, Cheol Seong Hwang and Hyeong Joon Kim

Thermal Stability of Pt-doped Ru Films Prepared by Chemical Vapor Deposition as Electrodes of the DRAM Capacitors

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

38

Wan-Don Kim, Gyu Weon Hwang, Seong Keun Kim, Oh Seong Kwon, Doo Seok Jeong and Cheol Seong Hwang

Atomic Layer Deposition of Titanium Based Oxide (TiO2, Bi2Ti2O7) Thin Films for MIM Capacitor of Next Generation Memory Devices

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

37

Seong Keun Kim, Wan Don Kim and Cheol Seong Hwang

Atomic Layer Deposition of Titanium Oxide Thin Films Using O3 for MIM Capacitor of Next Generation Memory Devices

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

36

Jin Shi-Zhao, Joon Seop Sim, Dong-Yeon Park, Hyun Ju Lee and Cheol Seong Hwang

Deposition Characteristics of Pb(ZrxTi1-x)O3 and PbO Thin Films on Pt and Ir Thin Film Substrates by Liquid Delivery Metal-organic Chemical Vapor Deposition

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

35

Joon Seop Sim, Jin Shi-Zhao, Dong-Yeon Park, Hyun Ju Lee and Cheol Seong Hwang

The Effects of Zirconium Concentration on Self Regulation Mechanism for Pb(ZrxTi1-x)O3 and PbTiO3 Thin Films Deposited by Liquid-Delivery Metal-organic Chemical Vapor Deposition

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

 

34

Tae Joo Park, Moonju Cho, Seong Keun Kim, Jaehoo Park, Seok Woo Lee, Sug Hun Hong and Cheol Seong Hwang

Electrical and Structural Properties of High-k Dielecric Films on SixGe1-x Substrates with Pre- and Post-treatments Using N2O and NH3

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

33

Moonju Cho, Jaehoo Park, Seong Keun Kim, Suk Woo Lee, Sug Hun Kim, Tae Joo Park and Cheol Seong Hwang

High-k Properties of Atomic-Layer-Deposited HfO2 Films Using a Nitrogen-containing Hf[N(CH3)2]4 Precursor and H2O or O3 Oxidant

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004), Poster

32

Jaehoo Park, Moonju Cho, Suk Woo Lee, Tae Joo Park, Sug Hun Hong, Doo Seok Jeong and Cheol Seong Hwang

Hot Carrier Effect in Self-aligned Poly-Si Gate n-type Field Effect Transistors with HfO2 Gate Dielectrics

The 5th Korea-Japan Conference on Ferroelectricity, Hoam Convention Center, Seoul National University, Seoul, Korea, August 18-21 (2004)