| 46 |
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Sang Young Lee, Hyung Suk Jung, Miyoung Kim, Cheol Seong Hwang, Gee-Man Kim, Kang Jun Choi, Jae Ho Choi, Jae Hak Jeong Structural Evolution and Electrical Properties of Al-Doped ALD HfO2 Thin Films and PEALD TaCxNy Metal Gate IWDTF 2008, Tokyo Institute of Technology, November 5-7 (2008) |
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| 45 |
Hyung-Suk Jung, Tae Joo Park, Jeong Hwan Kim, Sang Young Lee, Kwang Duck Na, Jung-Min Park, Weon-Hong Kim, Min-Woo Song, Nae-In Lee, Cheol Seong Hwang Systematic Study on Bias Temperature Instability of Various Hf-Based Oxides ; HfO2, (Hf,Al)Oy and (Hf,Zr)Oz IWDTF 2008, Tokyo Institute of Technology, November 5-7 (2008) |
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| 44 |
Bong Sop Yang, Myung Soo Huh, Jae Won Song, Cheol Seong Hwang, Hyeong Joon Kim Influence of low-pressure process and rapid thermal annealing treatment on the electrical property of Al2O3/SnO2 MIS capacitor 2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008) |
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| 43 |
Kwang Duk Na, Tae Joo Park, Jaewon Song, Jeong Hwan Kim, Cheol Seong Hwang, Sung Min Yoon, Sang-Hee Ko Park, Chi-Sun Hwang Effect of pre-deposition and post-deposition annealing of HfO2 on ZnO for transparent metal-insulator-semiconductor gate stack 2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008) |
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| 42 |
Deok-Yong Cho, Jaewon Song, Cheol Seong Hwang, W S Choi, T W Noh Electronic structure of amorphous InGaO3(ZnO)0.3 thin films 2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008) |
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| 41 |
Jeong Hwan Kim, Tae Joo Park, Kwang Duk Na, Myung soo Huh, Bong Sop Yang, Hyeong Joon Kim and Cheol Seong Hwang Influence of pre-deposition annealing and ozone treatment on the electrical property of HfO2/SnO2 MIS capacitor 2nd IS-TCO 2008, Hersonissos, Greece, October 22-26 (2008) |
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| 40 |
최설, 최병준, 엄태용, 황철성 Investigation on Ge doping effect in Sb rich SbxTe1-x(x>0.5) thin films deposited by PECVD 대한금속재료학회 2008년도 추계학술대회, 송도컨벤시아, 2008년 10월 23일-24일 |
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| 39 |
최병준, 최설, 엄태용, 황철성, 김윤정, 홍석경 Influence of substrates on the growth of Ge2Sb2Te5 films by combined atomic-layer- and chemical-vapor-deposition 대한금속재료학회 2008년도 추계학술대회, 송도컨벤시아, 2008년 10월 23일-24일 |
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| 38 |
황철성, 최병준, 최설, 엄태용, 김윤정, 홍석경 Plasma enhanced atomic layer deposition of Ge2Sb2Te5 films and its applications to phase change memory 대한금속재료학회 2008년도 추계학술대회, 송도컨벤시아, 2008년 10월 23일-24일 |
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| 37 |
S. K. Kim, K. J. Choi, and C. S. Hwang Dielectric and Electrode Thin Films for Stack-Cell Structured DRAM Capacitors with sub 50-nm Design Rules The 6th Asian Meeting on Ferroelectrics, National Taipei University of Technology, Taipei, Taiwan, August 2-6 (2008) |
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