| 36 |
Cheol Seong Hwang Resistive switching memory devices using the metal/insulator/metal structure : A detailed model for the unipolar and bipolar resistive switching in TiO2 thin films The 7th Korea-Japan Conference on Ferroelectricity, Cheju International Center, Cheju National University, Jeju, Korea, August 6-9 (2008) |
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| 35 |
Cheol Seong Hwang,Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo, Kwang Duk Na, Mi Young Kim TaCxNy Metal Gate and HfO2 Dielectric Grown by Atomic Layer Deposition for Advanced Gate Stacks IUMRS-ICEM 2008, Sydney,Australia, July 28 - August 1 (2008) |
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| 34 |
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na and Cheol Seong Hwang Metal Work-Function Tunability and Interfacial Reaction with Underlying High-K Layer of Peald TaCxNy Films IUMRS-ICEM 2008, Sydney,Australia, July 28 - August 1 (2008) |
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| 33 |
Sang Woon Lee, Jeong Hwan Han and Cheol Seong Hwang Atomic Layer Deposition of SrTiO3 Thin Films at a High Temperature (370℃) IUMRS-ICEM 2008, Sydney,Australia, July 28 - August 1 (2008) |
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| 32 |
Seong Keun Kim, Gyu Jin Choi, Jeong Hwan Kim and Cheol Seong Hwang Study on growth behavior of the doped materials by atomic layer deposition: a case study for Al-doped TiO2 films ALD 2008, Bruges, Belgium, June 29 - July 2 (2008) |
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| 31 |
Hyun Ju Lee, Gun Hwan Kim, and Cheol Seong Hwang Atomic layer deposition of lead titanate and its component oxide films using H2O and O3 as oxidant ALD 2008, Bruges, Belgium, June 29 - July 2 (2008) |
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| 30 |
Byung Joon Choi, Seol Choi, Taeyoung Eom, Young Cheol Shin, Kyung Min Kim, Cheol Seong Hwang, Yoon Jung Kim, and Suk Kyoung Hong Influence of substrates on the growth of Ge2Sb2Te5 films by combined atomic-layer- and chemical-vapor-deposition ALD 2008, Bruges, Belgium, June 29 - July 2 (2008) |
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| 29 |
Jeong Hwan Han, Sang Woon Lee, Cheol Seong Hwang, Julien Gatineau, and Christian Dussarrat Atomic layer deposition of ruthenium and ruthenium dioxide thin films using RuO4 precursor for the DRAM capacitor electrode ALD 2008, Bruges, Belgium, June 29 - July 2 (2008) |
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| 28 |
Sang Young Lee, Seong Keun Kim, Jeong Hwan Kim, and Cheol Seong Hwang Enhancement of thermal stability of atomic layer deposited Ru films by in-situ H2 plasma treatment ALD 2008, Bruges, Belgium, June 29 - July 2 (2008) |
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| 27 |
Sang Woon Lee, Jeong Hwan Han and Cheol Seong Hwang Atomic Layer Deposition of SrTiO3 Thin Films at a High Temperature (370℃) ALD 2008, Bruges, Belgium, June 29 - July 2 (2008) |
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