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Total Papers : 628          Total Conferences : 902

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25

In Won Yeu, Gyuseung Han, Cheol Seong Hwang, and Jung-Hae Choi

An ab initio approach on the asymmetric stacking of GaAs 〈111〉 nanowires grown by a vapor–solid method

Nanoscale, DOI: 10.1039/d0nr02010a (2020)

24

Min Hyuk Park, Dong Hyun Lee, Kun Yang, Ju-Yong Park, Geun Taek Yu, Hyeon Woo Park, Monica Materano, Terence Mittmann, Patrick D. Lomenzo, Thomas Mikolajick, Uwe Schroeder and Cheol Seong Hwang

Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices

Journal of Materials Chemistry C, DOI: 10.1039/d0tc01695k (2020)

23

Roman I. Romanov, Maxim G. Kozodaev, Yury Y. Lebedinskii, Timofey V. Perevalov, Aleksandr S. Slavich, Cheol Seong Hwang, and Andrey M. Markeev

Radical-Enhanced Atomic Layer Deposition of a Tungsten Oxide Film with the Tunable Oxygen Vacancy Concentration

J. Phys. Chem. C, 124, 33, 18156-18164 (2020)

22

Jung Joon Pyeon‡, In-Hwan Baek‡, Young Geun Song, Gwang Su Kim, Ah-Jin Cho, Ga-Yeon Lee, Jeong Hwan Han, Taek-Mo Chung, Cheol Seong Hwang, Chong-Yun Kang*, and Seong Keun Kim*

Highly sensitive flexible NO2 sensor composed of vertically aligned 2D SnS2 operating at room temperatureaper subject

J. Mater. Chem. C, 8, 11874-11881 (2020)

21

Younjin Jang, Jun Shik Kim, Sukin Kang, Jihun Kim, Yonghee Lee, Kwangmin Kim, Whayoung Kim, Heenang Choi, Nayeon Kim, Taeyong Eom, Taek-Mo Chung, Woojin Jeon, Sang Yoon Lee, and Cheol Seong Hwang

Comparative Study on the Gate-Induced Electrical Instability of p-Type SnO Thin-Film Transistors with SiO2 and Al2O3/SiO2 Gate Dielectrics

physica status solidi (RRL)–Rapid Research Letters, DOI: 10.1002/pssr.202000304 (2020)

20

Beom Yong Kim, Baek Su Kim, Seung Dam Hyun, Ho Hyun Kim, Yong Bin Lee, Hyun Woo Park, Min Hyuk Park and Cheol Seong Hwang

Study of ferroelectric characteristics of Hf0.5Zr0.5O2 thin films grown on sputtered or atomic-layer-deposited TiN bottom electrodes

Applied Physics Letters, 117, 022902 (2020)

19

Min Hyuk Park, Dong Hyun Lee, Kun Yang, Ju-Yong Park, Geun Taek Yu, Hyeon Woo Park, Monica Materano, Terence Mittmann, Patrick D. Lomenzo, Thomas Mikolajick, Uwe Schroeder and Cheol Seong Hwang

Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices

Journal of Materials Chemistry C, DOI: 10.1039/d0tc01695k (2020)

18

Dohun Kim, Vladimir Kornijcuk, Cheol Seong Hwang, Doo Seok Jeong*

SPSNN: nth Order Sequence-Predicting Spiking Neural Network

IEEE Access (2020)

17

An Quan Jiang, Wen Ping Geng, Peng Lv, Jia-wang Hong, Jun Jiang, Chao Wang, Xiao Jie Chai, Jian Wei Lian, Yan Zhang, Rong Huang, David Wei Zhang, James F. Scott, and Cheol Seong Hwang

Ferroelectric domain wall memory with embedded selector realized in LiNbO3 single crystals integrated on Si wafers

Nature Materials, DOI: 10.1038/s41563-020-0702-z (2020)

16

Yoon Kyeung Lee*, Eui-Sang Park*, Chanyoung Yoo, Woohyun Kim, Jeong Woo Jeon, Manick Ha, and Cheol Seong Hwang

Atomic Layer Deposition of SnTe Thin Film Using Sn(N(CH3)2)4 and Te(Si(CH3)3)2 with Ammonia Co-injection

CRYSTAL GROWTH & DESIGN, DOI: 10.1021/acs.cgd.0c00457 (2020)

15

Dae Eun Kwon, Jihun Kim, Young Jae Kwon, Kyung Seok Woo, Jung Ho Yoon, and Cheol Seong Hwang

Area-Type Electronic Bipolar Resistive Siwtching of Pt/Al2O3/Si3N3.0/Ti with Forming-Free, Self-Rectification, and Nonlinear Characteristics

physica status solidi (RRL)–Rapid Research Letters., DOI: 10.1002/pssr.202000209 (2020)

14

Zhengchun Yang, Jianwen Wu, Peijun Li, Yuting Chen, Yu Yan, Bo Zhu, Cheol Seong Hwang, Wei Mi,  Jinshi Zhao, Kailiang Zhang,  Ruixuan Guo

Resistive random access memory based on gallium oxide thin films for selfpowered pressure sensor systems

Ceramics International, DOI: 10.1016/j.ceramint.2020.05.191 (2020)

13

Taehwan Moon, Hyun Jae Lee, Seung Dam Hyun, Baek Su Kim, Ho Hyun Kim, and Cheol Seong Hwang

Origin of the Threshold Voltage Shift in a Transistor with a 2D Electron Gas Channel at the Al2O3/SrTiO3 Interface

Advanced Electronic Materials, DOI: 10.1002/aelm.201901286 (2020)

12

Chanyoung Yoo, Woohyun Kim, Jeong Woo Jeon, Eui-Sang Park, Manick Ha, Yoon Kyeung Lee* and Cheol Seong Hwang*

Atomic Layer Deposition of GexSe1–x Thin Films for Endurable Ovonic Threshold Selectors with a Low Threshold Voltage

ACS Appl. Mater. Interfaces, 12, 20, 23110-23118 (2020)

11

Dae Seon Kwon, Cheol Hyun An, Sang Hyeon Kim, Dong Gun Kim, Junil Lim, Woojin Jeon* and Cheol Seong Hwang*

Atomic layer deposition of Ru thin films using (2,4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the effect of ammonia treatment during the deposition

Journal of Materials Chemistry C, 8, 6993 - 7004 (2020)

10

Guhyun Kim, Vladimir Kornijcuk, Jeeson Kim, Cheol Seong Hwang, Doo Seok Jeong

Optimal Distribution of Spiking Neurons Over Multicore Neuromorphic Processors

IEEE Access, 8, 69426 - 69437 (2020)

9

Baek Su Kim†, Seung Dam Hyun†, Taehwan Moon, Keum Do Kim, Young Hwan Lee, Hyeon Woo ParkYong Bin Lee, Jangho Roh, Beom Yong Kim, Ho Hyun Kim, Min Hyuk Park* and Cheol Seong Hwang*

A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis (ethylmethylamino) and Tetrakis(dimethylamino) Precursors

Nanoscale Research Letters, 15, 72 (2020)

8

In-Hwan Baek, Jung Joon Pyeon, Ga-Yeon Lee, Young Geun Song, Hansol Lee, Sung Ok Won, Jeong Hwan Han, Chong-Yun Kang, Taek-Mo Chung, Cheol Seong Hwang, and Seong Keun Kim

Cation-Regulated Transformation for Continuous Two-Dimensional Tin Monosulfide

Chemistry of Materials, 32, 6, 2313-2320 (2020)

7

Kyung Seok Woo, Yongmin Wang, Yumin Kim, Jihun Kim, Woohyun Kim, and Cheol Seong Hwang

A Combination of a Volatile-Memristor-Based True Random-Number Generator and a Nonlinear-Feedback Shift Register for High-Speed Encryption

Adv. Electron. Mater, 2020, 1901117, DOI:10.1002/aelm.201901117

6

Yuting Chen, Yu Yan, Jianwen Wu, Chen Wang, Jun Ye Lin, Jin Shi Zhao and Cheol Seong Hwang

Electrocforming-free, Flexible, and Reliable Resistive Random-Access Memory Based on an Ultrathin TaOx Film

ACS Appl. Mater. Interfaces, DOI:10.1021/acsami.9b22687