Doo Seok Jeong, Cheol Seong Hwang^*, J. D. Baniecki^*, T. Shioga, K. Kurihara, N. Kamehara, and M. Ishii

Dielectric constant dispersion of yttrium-doped (Ba,Sr)TiO₃ films in the high-frequency (10 kHz–67 GHz) domain

Applied Physics Letters, 87, 232903 (2005)

Seong Keun Kim, Kyung-Min Kim, Oh Seong Kwon, Sang Woon Lee, Chung Bae Jeon, Woo Young Park, Cheol Seong Hwang, and Jaehack Jeong

Structurally and Electrically Uniform Deposition of High-k TiO₂ Thin Films on a Ru Electrode in Three-Dimensional Contact Holes Using Atomic Layer Deposition

Electrochemical and Solid-State Letters, 12, 8, F59-F62 (2005)

Sug Hun Hong, Jae Hyuck Jang, Tae Joo Park, Doo Seok Jeong, Miyoung Kim, and Cheol Seong Hwang

Improvement of the current-voltage characteristics of a tunneling dielectric by adopting a Si₃N₄/SiO₂/Si₃N₄ multilayer for flash memory application

Applied Physics Letters, 87, 152106 (2005)

Chihoon Lee, Sang Yong No, Da Ii Eom, Cheol Seong Hwnag^*, and Hyeong Joon Kim^*

The Electrical and Physical Analysis of Pt Gate/Al₂O₃/p-Si (100) with Dual High-k Gate Oxide Thickness for Deep Submicron Complementary Metal-Oxide-Semiconductor Device with Low Power and High Reliability

Journal of Electronic Materials, 8, 34, (2005)

B. J. Choi, D. S. Jeong, S. K. Kim, C. Rohde, S. Choi, J. H. Oh, H. J. Kim, C. S. Hwang, K. Szot, R. Waser, B. Reichenberg, and S. Tiedke

Resistive switching mechanism of TiO₂ thin films grown by atomic-layer deposition

Journal of Applied Physics, 3, 98, 033715 (2005)

Yo-Sep Min, Young Jin Cho, Ju-Hye Ko, Eun Ju Bae, Wanjun Park, and Cheol Seong Hwang

Atomic Layer Deposition of Bi_1-x-yTi_xSi_yO_z Thin Films from Alkoxide Precursors and Water

Journal of The Electrochemical Society, 9, 152, F124-F128 (2005)

Suk Woo Lee, Sug Hun Hong, Jaehoo Park, Moonju Cho, Tae Joo Park, Cheol Seong Hwang, Yun-Seok Kim, Ha Jin Lim, Jong-Ho Lee, and Jeong Yeon Won

Fabrication of HfO₂ Thin-Film Capacitors with a Polycrystalline Si Gate Electrode and a Low Interface Trap Density

Electrochemical and Solid-State Letters, 9, 8, F32-F35 (2005)

Wan Don Kim, Gyu Weon Hwang, Oh Seong Kwon, Seong Keun Kim, Moonju Cho, Jeong Doo Seok, Sang Woon Lee, Min Ha Seo, Cheol Seong Hwang, Yo-Sep Min and Young Jin Cho

Growth characteristics of atomic layer deposited TiO₂ thin films on Ru and Si electrodes for memory capacitors applications

Journal of The Electrochemical Society, 8, 152, C552-C559 (2005)

Tae Joo Park, Seong Keun Kim, Jeong Hwan Kim, Jaehoo Park, Moonju Cho, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang

Electrical properties of high-k HfO₂ films on Si_1-xGe_x substrates

Microelectronic Engineering, 80, 222-225 (2005)

Sang Woon Lee, Oh Seong Kwon and Cheol Seong Hwang

Chemically conformal deposition of SrTiO₃ thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H₂O

Microelectronic Engineering , 80, 158-161, (2005)

Christina Rohde, Byung Joon Choi, Doo Seok Jeong, Seol Choi, Jin-Shi Zhao, and Cheol Seong Hwang

Identification of a determining parameter for resistive switching of TiO₂ thin films

Applied Physics Letters, 86, 262907, (2005)

Sang Yong No, Jin Ho Oh, Chung Bae Jeon, Mathias Schindler, Cheol Seong Hwang, and Hyeong Joon Kim

Study on the Step Coverage of Metallorganic Chemical Vapor Deposited TiO₂ and SrTiO₃ Thin Films

Journal of The Electrochemical Society, 6, 152, C435-C441 (2005)

Doo Seok Jeong and Cheol Seong Hwang

Tunneling current from a metal electrode to many traps in an insulator

Physical Review B, 71, 165327 (2005)

Moonju Cho, Hong Bae Park, Jaehoo Park, Suk Woo Lee, Cheol Seong Hwang, Jaehack Jeong, Hee Sung Kang, and Young Wook Kim

Comparison of Properties of an Al₂O₃ Thin Layers Grown with Remote O₂ Plasma, H₂O, or O₃ as Oxidants in an ALD Process for HfO₂ Gate Dielectrics

Journal of The Electrochemical Society, 5, 152, F49-F53 (2005)

Jin Shi Zhao, Joon Seop Sim, Hyun Ju Lee, Dong-Yeon Park, and Cheol Seong Hwang

A Study of Liquid Delivery MOCVD of Lead Oxide Thin Films on Pt and Ir Substrates

Journal of The Electrochemical Society, 5, 152, C277-C282 (2005)

Jae Kyeong Jeong, Jung-Hae Choi, Hyun Jin Kim, Hui-Chan Seo, Hee Jin Kim, Euijoon Yoon, Cheol Seong Hwang^*, and Hyeong Joon Kim^*

Buffer-layer-free direct growth of high quality GaN on 4H-SiC substrate by metal-organic chemical vapor deposition

Journal of Crystal Growth, 276, 407-414 (2005)

Seong Keun Kim, Cheol Seong Hwang, Sang-Hee Ko Park, Sun Jin Yun

Comparison between ZnO films grown by atomic layer deposition using H₂O or O₃ as oxidant

Thin Solid Films, 478, 103-108 (2005)

Oh Seong Kwon, Seong Keun Kim, Moonju Cho, Cheol Seong Hwang, and Jaehack Jeong

Chemically Conformal ALD of SrTiO₃ Thin Films Using Conventional Metallorganic Precursors

Journal of The Electrochemical Society, 4, 152, C229-C236 (2005)

Jaehoo Park, Moonju Cho, Seong Keun Kim, Tae Joo Park, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang

Influence of the oxygen concentration of atomic-layer-deposited HfO₂ films on the dielectric property and interface trap density

Applied Physics Letters, 86, 112907 (2005)