HOME > Publication > Paper


Total Papers : 656          Total Conferences : 938

Citation Information supported by Google Scholar


Doo Seok Jeong and Cheol Seong Hwang

Tunneling-assisted Poole-Frenkel conduction mechanism in HfO2 thin films

Journal of Applied Physics, 98, 113701 (2005)


Doo Seok Jeong, Cheol Seong Hwang*, J. D. Baniecki*, T. Shioga, K. Kurihara, N. Kamehara, and M. Ishii

Dielectric constant dispersion of yttrium-doped (Ba,Sr)TiO3 films in the high-frequency (10 kHz–67 GHz) domain

Applied Physics Letters, 87, 232903 (2005)


Seong Keun Kim, Kyung-Min Kim, Oh Seong Kwon, Sang Woon Lee, Chung Bae Jeon, Woo Young Park, Cheol Seong Hwang, and Jaehack Jeong

Structurally and Electrically Uniform Deposition of High-k TiO2 Thin Films on a Ru Electrode in Three-Dimensional Contact Holes Using Atomic Layer Deposition

Electrochemical and Solid-State Letters, 12, 8, F59-F62 (2005)


Sug Hun Hong, Jae Hyuck Jang, Tae Joo Park, Doo Seok Jeong, Miyoung Kim, and Cheol Seong Hwang

Improvement of the current-voltage characteristics of a tunneling dielectric by adopting a Si3N4/SiO2/Si3N4 multilayer for flash memory application

Applied Physics Letters, 87, 152106 (2005)


Chihoon Lee, Sang Yong No, Da Ii Eom, Cheol Seong Hwnag*, and Hyeong Joon Kim*

The Electrical and Physical Analysis of Pt Gate/Al2O3/p-Si (100) with Dual High-k Gate Oxide Thickness for Deep Submicron Complementary Metal-Oxide-Semiconductor Device with Low Power and High Reliability

Journal of Electronic Materials, 8, 34, (2005)


B. J. Choi, D. S. Jeong, S. K. Kim, C. Rohde, S. Choi, J. H. Oh, H. J. Kim, C. S. Hwang, K. Szot, R. Waser, B. Reichenberg, and S. Tiedke

Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition

Journal of Applied Physics, 3, 98, 033715 (2005)


Yo-Sep Min, Young Jin Cho, Ju-Hye Ko, Eun Ju Bae, Wanjun Park, and Cheol Seong Hwang

Atomic Layer Deposition of Bi1-x-yTixSiyOz Thin Films from Alkoxide Precursors and Water

Journal of The Electrochemical Society, 9, 152, F124-F128 (2005)


Suk Woo Lee, Sug Hun Hong, Jaehoo Park, Moonju Cho, Tae Joo Park, Cheol Seong Hwang, Yun-Seok Kim, Ha Jin Lim, Jong-Ho Lee, and Jeong Yeon Won

Fabrication of HfO2 Thin-Film Capacitors with a Polycrystalline Si Gate Electrode and a Low Interface Trap Density

Electrochemical and Solid-State Letters, 9, 8, F32-F35 (2005)


Wan Don Kim, Gyu Weon Hwang, Oh Seong Kwon, Seong Keun Kim, Moonju Cho, Jeong Doo Seok, Sang Woon Lee, Min Ha Seo, Cheol Seong Hwang, Yo-Sep Min and Young Jin Cho

Growth characteristics of atomic layer deposited TiO2 thin films on Ru and Si electrodes for memory capacitors applications

Journal of The Electrochemical Society8, 152, C552-C559 (2005)


Tae Joo Park, Seong Keun Kim, Jeong Hwan Kim, Jaehoo Park, Moonju Cho, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang

Electrical properties of high-k HfO2 films on Si1-xGex substrates

Microelectronic Engineering, 80, 222-225 (2005)


Sang Woon Lee, Oh Seong Kwon and Cheol Seong Hwang

Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O

Microelectronic Engineering , 80, 158-161, (2005)


Christina Rohde, Byung Joon Choi, Doo Seok Jeong, Seol Choi, Jin-Shi Zhao, and Cheol Seong Hwang

Identification of a determining parameter for resistive switching of TiO2 thin films

Applied Physics Letters, 86, 262907, (2005)


Sang Yong No, Jin Ho Oh, Chung Bae Jeon, Mathias Schindler, Cheol Seong Hwang, and Hyeong Joon Kim

Study on the Step Coverage of Metallorganic Chemical Vapor Deposited TiO2 and SrTiO3 Thin Films

Journal of The Electrochemical Society, 6, 152, C435-C441 (2005)


Doo Seok Jeong and Cheol Seong Hwang

Tunneling current from a metal electrode to many traps in an insulator

Physical Review B, 71, 165327 (2005)


Moonju Cho, Hong Bae Park, Jaehoo Park, Suk Woo Lee, Cheol Seong Hwang, Jaehack Jeong, Hee Sung Kang, and Young Wook Kim

Comparison of Properties of an Al2O3 Thin Layers Grown with Remote O2 Plasma, H2O, or O3 as Oxidants in an ALD Process for HfO2 Gate Dielectrics

Journal of The Electrochemical Society, 5, 152, F49-F53 (2005)


Jin Shi Zhao, Joon Seop Sim, Hyun Ju Lee, Dong-Yeon Park, and Cheol Seong Hwang

A Study of Liquid Delivery MOCVD of Lead Oxide Thin Films on Pt and Ir Substrates

Journal of The Electrochemical Society, 5, 152, C277-C282 (2005)


Jae Kyeong Jeong, Jung-Hae Choi, Hyun Jin Kim, Hui-Chan Seo, Hee Jin Kim, Euijoon Yoon, Cheol Seong Hwang*, and Hyeong Joon Kim*

Buffer-layer-free direct growth of high quality GaN on 4H-SiC substrate by metal-organic chemical vapor deposition

Journal of Crystal Growth, 276, 407-414 (2005)


Seong Keun Kim, Cheol Seong Hwang, Sang-Hee Ko Park, Sun Jin Yun

Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant

Thin Solid Films, 478, 103-108 (2005)


Oh Seong Kwon, Seong Keun Kim, Moonju Cho, Cheol Seong Hwang, and Jaehack Jeong

Chemically Conformal ALD of SrTiO3 Thin Films Using Conventional Metallorganic Precursors

Journal of The Electrochemical Society, 4, 152, C229-C236 (2005)


Jaehoo Park, Moonju Cho, Seong Keun Kim, Tae Joo Park, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang

Influence of the oxygen concentration of atomic-layer-deposited HfO2 films on the dielectric property and interface trap density

Applied Physics Letters, 86, 112907 (2005)