Kuan Yew Cheong, Jeong Hyun Moon, Tae Joo Park, Jeong Hwan Kim, Cheol Seong Hwang, Hyeong Joon Kim, Wook Bahng and Nam-Kyun Kim

Improved Electronic Performance of HfO₂/SiO₂ Stacking Gate Dielectric on 4H SiC

IEEE Transactions on Electron Devices, 12, 54, 3409 (2007)

Takayuki Watanabe, Susanne Hoffmann-Eifert, Frank Peter, Shaobo Mi, Chunlin Jia, Cheol Seong Hwang and Rainer Wasera

Liquid Injection ALD of Pb(Zr,Ti)O_x Thin Films by a Combination of Self-Regulating Component Oxide Processes

Journal of The Electrochemical Society, 12, 152, G262-G269 (2007)

Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Minha Seo, Cheol Seong Hwang, and Jeong Yeon Won

Comparison of Electrical Properties Between HfO₂ Films on Strained and Relaxed Si_1−xGe_x Substrates

Electrochemical and Solid-State Letters, 12, 10, G97-G100 (2007)

Dail Eom, Sang Yong No, Heechul Park, Cheol Seong Hwang, and Hyeong Joon Kim

Improvement in Thermal Stability of Stacked Structures of Aluminum Nitride and Lanthanum Oxide Thin Films on Si Substrate

Electrochemical and Solid-State Letters, 12, 10, G93-G96 (2007)

Hyun Ju Lee, Gun Hwan Kim, Keun Lee, and Cheol Seong Hwang

Initial Growth Behavior of a Lead Oxide Thin Film on Ir Substrates by Atomic Layer Deposition

Electrochemical and Solid-State Letters, 12, 10, G89-G92 (2007)

Gyu Weon Hwang, Wan Don Kim, Cheol Seong Hwang, Yo-Sep Min and Young Jin Cho

Atomic Layer Deposition of Bi_1−x−yTi_xSi_yO_z Thin Films Using H₂O Oxidant and Their Characteristics Depending on Si Content

Journal of the Electrochemical Society, 11, 154, H915-H918 (2007)

Beom Seok Kim, Sang Yeol Kang, Han Seok Seo, Cheol Seong Hwang and Hyeong Joon Kim

Improved Nucleation Behavior of Ru Thin Films Prepared by MOCVD on TiCl₄ Pretreated Substrates

Electrochemical and Solid-State Letters, 10, 10, D113-D115 (2007)

Byung Joon Choi, Seol Choi, Yong Cheol Shin, Kyung Min Kim, Cheol Seong Hwang, Yoon Jung Kim, Young Jin Son, and Suk Kyoung Hong

Combined Atomic Layer and Chemical Vapor Deposition, and Selective Growth of Ge₂Sb₂Te₅ Films on TiN/W Contact Plug

Chemistry of Materials, 19, 4387-4389 (2007)

Seong Keun Kim, Sang Young Lee, Minha Seo, Gyu-Jin Choi, and Cheol Seong Hwang

Impact of O₃ feeding time on TiO₂ films grown by atomic layer deposition for memory capacitor applications

Journal of Applied Physics, 102, 024109 (2007)

Yo-Sep Min, Eun Ju Bae, Jong Bong Park, Un Jeong Kim, Wanjun Parka, Jaewon Song and Cheol Seong Hwang, Noejung Park

ZnO nanoparticle growth on single-walled carbon nanotubes by atomic layer deposition and a consequent lifetime elongation of nanotube field emission

Applied Physics Letters, 90, 263104 (2007)

P. Zhou, Y. C. Shin, B. J. Choi, S. Choi, C. S. Hwang, Y. Y. Lin, H. B. Lv, X. J. Yan, T. A. Tang, L. Y. Chen, and B. M. Chen

Dynamic Threshold Switching Behavior of Ge₂Sb₂Te₅ and Sb-doped Ge₂Sb₂Te₅ Thin Films Using Scanning Electrical Nanoprobe

Electrochemical and Solid-State Letters, 9, 10, H281-H283 (2007)

Kyung Min Kim, Byung Joon Choi, Yong Cheol Shin, Seol Choi, and Cheol Seong Hwang

Anode-interface localized filamentary mechanism in resistive switching of TiO₂ thin films

Applied Physics Letters, 91, 012907 (2007)

Hyo-Shin Ahn and Seungwu Han, Cheol Seong Hwang

Pairing of cation vacancies and gap-state creation in TiO₂ and HfO₂

Applied Physics Letters, 90, 252908 (2007)

Kyung Min Kim, Byung Joon Choi, and Cheol Seong Hwang

Localized switching mechanism in resistive switching of atomic-layer-deposited TiO₂ thin films

Applied Physics Letters, 90, 242906 (2007)

Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo,Kwang Duk Na, Cheol Seong Hwang

Enhancement in thermal stability of atomic layer deposited HfO₂ films by using top Hf metal layer

Microelectronic Engineering, 84, 2226–2229 (2007)

Moonju Cho, Jeong Hwan Kim, Cheol Seong Hwang, Hyo-Shin Ahn, Seungwu Han, and Jeong Yeon Won

Effects of carbon residue in atomic layer deposited HfO₂ films on their time-dependent dielectric breakdown reliability

Applied Physics Letters, 90, 182907 (2007)

Takayuki Watanabe, Susanne Hoffmann-Eifert, Lin Yang, Andreas Rudiger, Carsten Kugeler, Cheol Seong Hwang, and Rainer Waser

Liquid Injection Atomic Layer Deposition of TiO_x Films Using Ti[OCH(CH₃)₂]₄

Journal of The Electrochemical Society, 6, 154, G134-140 (2007)

Oh Seong Kwon, Sang Woon Lee, Jeong Hwan Han, and Cheol Seong Hwang

Atomic Layer Deposition and Electrical Properties of SrTiO₃ Thin Films Grown Using Sr(C₁₁H₁₉O₂)₂, Ti(Oi-C₃H₇)₄, and H₂O

Journal of The Electrochemical Society, 6, 154, G127-133 (2007)

Tae Joo Park, Jeong Hwan Kim, Min Ha Seo, Jae Hyuck Jang, and Cheol Seong Hwang

Improvement of thermal stability and composition changes of atomic layer deposited HfO₂ on Si by in situ O₃ pretreatment

Applied Physics Letters, 90, 152906 (2007)