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[Deposition] ALD system for HfO2, Al2O3,ZrO2 & HfSiOx
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2016-03-29 10:33:57
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2650
Á¦ÀÛȸ»ç : Quros
¸ðµ¨¸í : PLUS200
¿ëµµ : HfO
2
, Al
2
O
3
,ZrO
2
& HfSiO
x
ÁõÂø
Ư¡ :
- Thermal ALD system
- 8¡± size chamber 2EA (standard 4, 6, 8¡± available)
- Si, Ge, GaAs substrate
- HfO
2
, Al
2
O
3
, ZrO
2
, HfSiO
x
- Ozone Generator ~350 g/m
3
´ã´çÀÚ : º¯½Â¿ë, ¹éÀΰæ
¸ñ·Ï
ÀÌÀü±Û
ALD system for GeSbTe(Quros)
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ALD system for Ru & RuO2