58 |
Jangho Roh, H.W.Park, Y.B.Lee, S.D.Hyun, K.D.Kim, T.H.Moon, Y.H.Lee, B.S.Kim, B.Y.Kim, H.H.Kim, and C.S.Hwang Ferroelectric Characteristics of Hf0.5Zr0.5O2-based Metal-Ferroelectric-Insulator-Semiconductor Capacitors for Steep-Slope transistor Application IEEE SISC 2018, San Diego (USA), DEC.4-8 (2018), Poster
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57 |
Gyuseung Han, In Won Yeu, Seung Cheol Lee, Cheol Seong Hwang, and Jung-Hae Choi Phase Diagram of Ga(As,Sb) and (In,Ga)As by Cluster Expansion and DFT Calculations ASIAN-21, KAIST, Daejeon, Korea, Oct 29-31 (2018), Poster |
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56 |
In Won Yeu, Gyuseung Han, Cheol Seong Hwang, and Jung-Hae Choi Vibrational effects on the surface energy of III-V compound semiconductors using ab-initio thermodynamics ASIAN-21, KAIST, Daejeon, Korea, Oct 29-31 (2018), Poster |
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55 |
Soon Hyung Cha, Cheol Hyun An, Sang Hyeon Kim, Dae Seon Kwon, Seong Tak Cho, and Cheol Seong Hwang Atomic Layer Deposition of ZrO2/Al2O3/TiO2 thin films with high dielectric constant on TiN substrates for DRAM capacitors E-MRS 2018, Warsaw (Poland), Sep 17-20 (2018), Poster |
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54 |
Woohyun Kim, Chanyoung Yoo, Eui-sang Park, Yoon Kyeung Lee, Jeong Woo Jeon, Manick Ha, and Cheol Seong Hwang Atomic Layer Deposition of GeSe films with Discrete Feeding Method for Ovonic Threshold Switch E-MRS 2018, Warsaw (Poland), Sep 17-20 (2018), Poster
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53 |
Chanyoung Yoo, Eui-sang Park, Yoon Kyeung Lee, Woohyun Kim, Jeong Woo Jeon, Manick Ha, and Cheol Seong Hwang Atomic Layer Deposition of TiTe2 Thin Films for Ti-Sb-Te Phase Change Memory Application E-MRS 2018, Warsaw (Poland), Sep 17-20 (2018), Poster
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52 |
In-Hwan Baek, Jung Joon Pyeon, Taek-Mo Chung, Jeong Hwan Han, Cheol Seong Hwang, and Seong Keun Kim Atomic Layer Deposited Quaternary InZnSnO Thin Films for Emerging Electronic Devices International Meeting on Information Display, Busan, South Korea, Aug 28-31 (2018), Oral
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51 |
In Won Yeu, Gyuseung Han, Cheol Seong Hwang, and Jung-Hae Choi Surface phase diagram of GaAs(001) considering the vibrational thermal energy by ab-initio calculation IUMRS-ICEM 2018, Daejeon, Korea, Aug 19-24 (2018), Oral |
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50 |
Yong Bin Lee, J.H.Roh, H.W.Park, K.D.Kim, T.H.Moon, Y.H.Lee, S.D.Hyun, B.S.Kim, B.Y.Kim, H.H.Kim, and C.S.Hwang Internal Oxide Engineering of Hafnium Zirconium Oxide-Based Ferroelectric Capacitors for Ferroelectric and Negative Capacitance Field Effect Transistor Application 12th Japan-Korea Conference on Ferroelectrics, Nara, Japan, August 5 - August 8 (2018), Poster
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49 |
Jangho Roh, H.W.Park, Y.B.Lee, S.D.Hyun, K.D.Kim, T.H.Moon, Y.H.Lee, B.S.Kim, B.Y.Kim, H.H.Kim, and C.S.Hwang Ferroelectric Characteristics of Hf0.5Zr0.5O2-based Metal-Ferroelectric-Insulator-Semiconductor Capacitors for steep-slope transistor 12th Japan-Korea Conference on Ferroelectrics, Nara, Japan, August 5 - August 8 (2018), Poster
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