Sang Hyeon Kim, C.H. An, D.S. Kwon, S.T. Cho, S.H. Cha, and C.S. Hwang

Electriclal Properties of Al-doped SrTiO₃ Films Grown by Atomic Layer Deposition on Ru Electrodes

18th International Conference on Atomic Layer Deposition, Incheon, South Korea, July 29 - August 1 (2018), Poster

Baek Su Kim, H.J. Kim, S.D. Hyun, Y.H. Lee, K.D. Kim, T.H. Moon, H.W. Park, Y.B. Lee, J.H. Noh, and C.S. Hwang

Use of New Cyclopentadienyl Tris(dimethylamino) Based Zirconium Precursors for the Leakage Current Reduction of Atomic Layer Deposited ZrO₂- Thin Films

18th International Conference on Atomic Layer Deposition, Incheon, South Korea, July 29 - August 1 (2018), Poster

Dae Seon Kwon, C.H. An, S.H. Kim, H. Song, S.T. Cho, S.H. Cha, T. Furukawa, T. Hayakawa, K. Kawano, and C.S. Hwang

Atomic Layer Deposition of Ru Thin Films Using ‘Rudense’ as a Ru Precursor and Oxygen Gas as a Reactant

18th International Conference on Atomic Layer Deposition, Incheon, South Korea, July 29 - August 1 (2018), Poster

Keum Do Kim, Yu Jin Kim, Hyeon Woo Park, Han Joon Kim, Taehwan Moon, Young Hwan Lee, Seung Dam Hyun, Yong Bin Lee, Min Hyuk Park, and Cheol Seong Hwang 

Negative capacitance effect in the atomic-layer-deposited Al₂O₃/Hf_0.3Zr_0.7O₂ bilayer thin film

2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference, Hiroshima, Japan, May 27th-June 1st 2018, Poster

Seung Dam Hyun, Hyeon Woo Park, Yu Jin Kim, Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Young Jae Kwon, Taehwan Moon, Keum Do Kim, Yong Bin Lee, Beak Su Kim, and Cheol Seong Hwang

Dispersion in ferroelectric switching performance of polycrystalline Hf_0.5 Zr_0.5O₂ thin films

2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference, Hiroshima, Japan, May 27th-June 1st 2018, Poster

Soon Hyung Cha, Cheol Hyun An, Sang Hyeon Kim, Dong Gun Kim, Dae Seon Kwon, Seong Tak Cho and Cheol Seong Hwang

Structure and Electrical Properties of TiO₂/Al₂O₃/ZrO₂ Films Grown via Atomic Layer Deposition on TiN Electrodes

233rd ECS Meeting, Seattle, May 13-17(2018), Poster

Seong Tak Cho, Cheol Hyun An, Sang Hyeon Kim, Dong Gun Kim, Dae Seon Kwon, Soon Hyung Cha, and Cheol Seong Hwang

Electrical and structural properties of ZrO₂/Y₂O₃/ZrO₂ dielectric film for DRAM capacitor

233rd ECS Meeting, Seattle, May 13-17(2018), Poster

Hae Jin Kim, Tae Hyung Park, Kyung Jean Yoon, Gil Seop Kim, Tae Jung Ha, Soo Gil Kim, and Cheol Seong Hwang*

Cu cone inserted CBRAM device fabrication and its improved switching reliability induced by field concentration effect

IEEE EDTM 2018, Japan, March 13-16 (2018), Poster

Cheol Hyun An, Sang Hyeon Kim, Dae Seon Kwon, Soon Hyung Cha, Sung Tak Cho and Cheol Seong Hwang

Atomic layer deposition(ALD) of Ru thin film on Ta₂O₅/Si substrate using RuO₄ precursor and H₂ gas

IEEE EDTM 2018, Japan, March 13-16 (2018), Poster