| 6 |
Doo Seok Jeong, Hong Bae Park, and Cheol Seong Hwang Reasons for obtaining an optical dielectric constant from the Poole-Frenkel conduction behavior of atomic layer deposited HfO2 films Applied Physics Leteers, 86, 072903 (2005) |
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| 5 |
Yo-Sep Min, Young Jin Cho and Cheol Seong Hwang Atomic Layer Deposition of Al2O3 Thin Films from 1-methoxy-2-methyl-2-propoxide Complex of Aluminum and Water Chemistry of Materials, 17, 626-631 (2005) |
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| 4 |
Yo-Sep Min, Young Jin Cho, Igor P. Asanov, Jeong Hee Han, Wan Don Kim and Cheol Seong Hwang Bi1-yTixSiyOz (BTSO) thin films for dynamic random access memory capacitor applications Chemical Vapor Deposition, 1, 11, 38 (2005) |
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| 3 |
Tae Joo Park, Doo Seok Jung, Cheol Seong Hwang, Min Soo Park and Nam-Seok Kang Fabrication of ultra thin IrO2-top-electrode for improving thermal stability of metal-insulator-metal field emission cathodes Thin Solid Films, 471, 236-242 (2005) |
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| 2 |
Sang Yeol Kang, Cheol Seong Hwang and Hyeong Joon KimImprovements in Growth Behavior of CVD Ru Films on Film Substrates for Memory Capacitor Integration Journal of The Electrochemical Society, 1, 152, C15-C19 (2005) |
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| 1 |
Sang Yeol Kang, Sang Yong No, Jung-Hae Choi, Cheol Seong Hwang and Hyeong Joon Kim Pt-doped Ru Films Prepared by Chemical Vapor Deposition as Electrodes of Dynamic Random Access Memory Capacitors Electrochemical and Solid-State Letters, 1, 8, C12-C14 (2005) |
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