| 10 |
J.M.Lee, S.K.Hong, C.S.Hwang, H.J.Kim and C.G.Suk Characterization of Pt electrodes for ferroelectric thin films prepared by metallorganic chemical vapor deposition using Pt(CF3COCHCOCF3)2 and (CH3C5H4)Pt(CH3)3 Journal of the Korean Physical Society, 33, S148-S151 (1998)
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| 9 |
C.S.Hwang (Ba,Sr)TiO3 thin films for ultra large scale dynamic random access memory- A review on the process integration Materials Science and Engineering B, 2-3, 56, 178-190 (1998)
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| 8 |
J.C.Shin, J.M.Lee, C.S.Hwang, H.J.Kim, J.W.Hong, and Z-G.Kim Control of the microstructure of (Pb,La)TiO3 thin films by metal-organic chemical vapor deposition using a solid delivery system for ferroelectric domain memory Japanese Journal of Applied Physics, 37, 5123-5125 (1998)
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| 7 |
J.M.Lee, J.C.Shin, C.S.Hwang, H.J.Kim and C.G. Suk Preparation of high quality RuO2 electrodes for high dielectric films by low pressure metal organic chemical vapor deposition Journal of Vacuum Science & Technology A, 5, 16, 2768-2771 (1998)
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| 6 |
J.C.Shin, J.M.Lee, S.K.Hong, H.J.Cho, K.S.Kim, C.S.Hwang and H.J.Kim Electrical properties of (Pb,La)TiO3 thin films deposited by low pressure metal-organic chemical vapor deposition using solid delivery system Journal of Vacuum Science & Technology A, 4, 16, 2591-2594 (1998)
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| 5 |
C.S.Hwang, B.T.Lee, H.J.Cho, H.Horii, J.W.Kim, C.S.Kang, S.I.Lee and M.Y.Lee A comparative study on the electrical conduction mechanism of (Ba,Sr)TiO3 thin films on Pt and IrO2 electrodes Journal of Applied Physics, 7, 83, 3703-3713 (1988)
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| 4 |
J.M.Lee, C.S.Hwang, H.J.Cho and H.J.Kim Effect of O2 addition on the deposition of Pt thin films by metalorganic chemical vapor deposition Journal of the Electrochemical Society, 3, 145, 1066-1069 (1998)
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| 3 |
C.S.Hwang, M.D.Vaudin and P.K.Schenk Influence of the microstructure of Pt/Si substrates on textured growth of barium titanate thin films prepared by pulsed laser deposition Journal of Materials Research, 2, 13, 368-375 (1998)
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| 2 |
J.M.Lee, J.C.Shin, K.S.Kim, H.J.Cho, H.J.Kim, C.S.Hwang and C-G. Suk Deposition and characterization of MOCVD Pt film as a top electrode for high dielectric film Journal of the Korean Physical Society, 32, S1535-S1537 (1998)
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| 1 |
J.C.Shin, S-K Hong, J.M.Lee, H.J.Cho, K.S.Kim, C.S.Hwang and H.J.Kim Preparation and characterization of (Pb,La)TiO3 thin films by solid source mixture metal organic chemical vapor deposition Journal of the Korean Physical Society, 32, S1529-S1531 (1998)
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