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38

Seung Dam Hyun, Yu Jin Kim, Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Taehwan Moon, Keum Do Kim, Hyeonwoo Park, and Cheol Seong Hwang

Study on ferroelectric switching kinetics affected by wake up effect in Hf0.5Zr0.5O2 films

KJC-FE11, Sungkyunkwan University, Seoul, Korea, August 9th 2016, poster
37

Keum Do Kim. Min Hyuk Park, Yu Jin Kim, Han Joon Kim, Taehwan Moon, Seung Dam Hyun, Hyeonwoo Park, and Cheol Seong Hwang

Ferroelectric to antiferroelectric transition in Hf0.5Zr0.5O2 thin films induced by deposition temperature control during atomic layer deposition

KJC-FE11, Sungkyunkwan University, Seoul, Korea, August 9th 2016, poster
36

Cheol Seong Hwang

Memristors for cognitive computing

KJC-FE11, Sungkyunkwan University, Seoul, Korea, August 9th 2016
35 Cheol Hyun An, Woongkyu Lee, Sang Hyeon Kim, Hoju Song and Cheol Seong Hwang

Growth and electric characteristics of SrRuO3/Pt bimetal electrodes for SrTiO3 dielectric layer

ALD2016, Dublin Ireland, 24-27 July(2016), Poster
34

Hoju Song, Cheol Hyun An, Younjin Jang, Sang Hyeon Kim, Min Jung Chung and Cheol Seong Hwang

Adoption of SnO2 thin films to prevent reduction RuO2 to Ru during atomic layer deposition of TiO2 films for DRAM Capacitor

ALD2016, Dublin Ireland, 24-27 July(2016), Poster
33
Dong Gun Kim, Jae-Ho Lee, Hyun Jae lee, Cheol Seong Hwang

Passivation layer effects on Ge substrate for the higher-k TiO2 dielectric material application

ALD2016, Dublin Ireland, 24-27 July(2016), Poster
32
Jun Shik Kim, Eun Suk hwang, Seungjun Lee, Younjin Jang, Gye Hwan Cho, Cheol Seong Hwang

Effect of deposition temperature and oxygen sources on electrical properties of atomic layer deposited amorphous zinc tin oxide thin film for thin film transistors

ALD2016, Dublin Ireland, 24-27 July(2016), Poster
31

Jae Ho Lee, Dong Gun Kim, Hyun Jae Lee and Cheol Seong Hwang

Characteristics of PDA temperature effects and electrical performance on Ge substrate with respect to passivation layers and Hf-based dielectircs

ALD2016, Dublin Ireland, 24-27 July(2016), Poster
30
Cheol Jin Cho, Jun-Yun Kang, Cheol Seong Hwang, and Seong Keun Kim

Interface engineering explosive crystallization of TiO2 films in low temperature atomic layer deposition

ALD2016, Dublin Ireland, 24-27 July(2016), Poster
29

Sang Hyeon Kim, Woongkyu Lee, Cheol Hyun An, Min Jung Chung, Hoju Song and Cheol Seong Hwang

Atomic layer deposition of SrTiO3 films with cyclopentadienyl-based precursors for DRAM capacitor application

ALD2016, Dublin Ireland, 24-27 July(2016), Poster