| 2 |
B.K. Park, J. Park, C.S. Hwang, Y.K. Han, D.H. Kim, D.Y. Yang, and K.Y. Oh Electrical properties of Hafnium oxide thin films deposited by a chemical vapor deposition for gate dielectric application 13th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 11-14 (2001)
|
 |
| 1 |
J. Park, B.K. Park, C.S. Hwang, Y.K. Han, D.H. Kim, D.Y. Yang, and K.Y. Oh Deposition of HfO2 thin films for gate dielectric layer 13th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 11-14 (2001), Poster |
|
HOME > Publication > Conference
