30 |
Dong Hoon Shin, Taegyun Park, Yeong Rok Kim, and Cheol Seong Hwang* Highly Reliable Dual-mode Memristor with Digital and Analog Features 2023 International Conference on Solid State Devices and Materials, Nagoya, Japan, September 5-8, Poster |
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29 |
Chanyoung Yoo‚ Wonho Choi‚ Jeong Woo Jeon‚ Byongwoo Park‚ Gwangsik Jeon‚ Sangmin Jeon‚ Cheol Seong Hwang Wafer-Scale Controlled Growth of Two-Dimensional Metal Dichalcogenides Through Atomic Layer Deposition and Top-Bottom Epitaxy 23rd International Conference on Atomic Layer Deposition, Bellevue, USA, July 23 to 26, Oral |
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28 |
Seung Kyu Ryoo, Kyung Do Kim, and Cheol Seong Hwang* Unveiling the Impact of Elevated Temperature Annealing on AlScN Films under Nitrogen and Ammonia Ambient Conditions 2023 IEEE ISAF-ISIF-PFM, Cleveland, Ohio, USA, July 23 to 27, Poster |
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27 |
Kyung Do Kim, Yong Bin Lee, Suk Hyun Lee, In Soo Lee, Seungyong Byun, Jae Hoon Lee, Hani Kim, Hyeon Woo Park, and Cheol Seong Hwang Origin of fatigue phenomenon in aluminum scandium nitride 2023 IEEE ISAF-ISIF-PFM, Cleveland, Ohio, USA, July 23 to 27, Poster |
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26 |
SeongJae Shin, Seung Yong Byun, Hani Kim, and Cheol Seong Hwang* The atomic layer deposited 5nm Ferroelectric/Antiferroelectric hafnium zirconium oxide using heteroleptic Hf/Zr precursor
2023 IEEE ISAF-ISIF-PFM, Cleveland, Ohio, USA, July 23 to 27, Poster |
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25 |
Yu Kyung Park, Hae Won Song, Tae Kyun Kim, Junil Lim, Haengha Seo, Heewon Paik, Jonghoon Shin, and Cheol Seong Hwang Magnesium-doping in TiO2 Dielectric Films for DRAM Capacitor Applications
23rd International Conference on Atomic Layer Deposition, Bellevue, USA, July 23 to 26, Poster |
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24 |
Youngsin Kim, Junil Lim, Dae Seon Kwon, Keonuk Lee, Yukyung Park, Haengha Seo, Tae Kyun Kim, Heewon Paik, Haewon Song, Jong Hoon Shin, and Cheol Seong Hwang Growth and crystallization of SrRuO3 films by atomic layer deposition depending on the substrates 23rd International Conference on Atomic Layer Deposition, Bellevue, USA, July 23 to 26, Poster |
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23 |
Haengha Seo, Jonghoon Shin, Junil Lim, Tae Kyun Kim, Heewon Paik, and Cheol Seong Hwang Non-Diffusive Phenomenon of Al and Y Doping in the ZrO2/Al2O3 and ZrO2/Y2O3 Bilayer Thin-Films and Its Influence on the Field-Induced Ferroelectric Properties 23rd International Conference on Atomic Layer Deposition, Bellevue, USA, July 23 to 26, Poster |
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22 |
Tae Kyun Kim, Dae Seon Kwon, Junil Lim, Haengha Seo, Heewon Paik, Jonghoon Shin, and Cheol Seong Hwang Yttrium-doping in TiO2 Films for DRAM Capacitor Applications
23rd International Conference on Atomic Layer Deposition, Bellevue, USA, July 23 to 26, Poster |
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21 |
Junil Lim, Kun Hee Ye, Dae Seon Kwon, Haengha Seo, Tae Kyun Kim, Heewon Paik, Haewon Song, Jong Hoon Shin, Jung-Hae Choi and Cheol Seong Hwang Improved Properties of the SrRuO3 Electrode by Controlling Annealing Conditions and Adopting Al-doping 23rd International Conference on Atomic Layer Deposition, Bellevue, USA, July 23 to 26, Poster |
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