B.K. Park, J. Park, C.S. Hwang, Y.K. Han, D.H. Kim, D.Y. Yang, and K.Y. Oh
Electrical properties of Hafnium oxide thin films deposited by a chemical vapor deposition for gate dielectric application
13th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 11-14 (2001)
J. Park, B.K. Park, C.S. Hwang, Y.K. Han, D.H. Kim, D.Y. Yang, and K.Y. Oh
Deposition of HfO2 thin films for gate dielectric layer
13th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 11-14 (2001), Poster