25 |
Yeon Woo Yoo, Woojin Jeon, Woongkyu Lee, Jeong Hwan Han, and Cheol Seong Hwang Comparison between Atomic Layer Deposited TiO2 Films on Various Substrates with Different Growth Temperature ALD 2012, Dresden, Germany, June 17-20 (2012), Poster |
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24 |
Seul Ji Song, Gun Hwan Kim, Jun Yeong Seok, Kyung Jean Yoon, Julien Gatineau, and Cheol Seong Hwang Substrate dependent growth behaviors of plasma-enhanced atomic layer deposition of NiO ALD 2012, Dresden, Germany, June 17-20 (2012), Poster |
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23 |
Woojin Jeon, Hyo Kyeom Kim, Woongkyu Lee, Yeon Woo Yoo, Jeong Hwan Han, and Cheol Seong Hwang Acheiving EOT of 4.0 ¡Ê from Al-doped TiO2 film with RuO2 Top Electrode ALD 2012, Dresden, Germany, June 17-20 (2012), Poster |
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22 |
Hyo Kyeom Kim, Sang Young Lee, Il-Hyuk Yu, Jae Ho Lee, Tae Joo Park, and Cheol Seong Hwang Scaling of equivalent oxide thickness using La-incorporated metal gates on ALD Hf1-xSixO2 gate dielectrics ALD 2012, Dresden, Germany, June 17-20 (2012), Poster |
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21 |
Min Hyuk Park, Hyun Ju Lee, Gun Hwan Kim, Yu Jin Kim, Jeong Hwan Kim, Jong Ho Lee, and Cheol Seong Hwang Novel tri-states memory using ferroelectric-insulator-semiconductor hetero-junctions for fifty percent increased data storage WoDiM, Dresden, Germany, June 25-27 (2012) |
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20 |
Yoonsoo Jung, Sae-Jin Kim, Kyoung-Jin Choi, Seung-Cheol Lee, Cheol Seong Hwang and Jung-Hae Choi Á¦ÀÏ¿ø¸® °è»êÀ» ÀÌ¿ëÇÑ SrTiO3 ±âÆÇ À§ÀÇ Epitaxial SrRuO3 ¹Ú¸·ÀÇ µÎ²²¿¡ µû¸¥ »óÀüÀÌ ¿¬±¸ 2012³âµµ ´ëÇѱݼÓÀç·áÇÐȸ Ãá°èÇмú´ëȸ, Çö´ë ¼º¿ì¸®Á¶Æ®, Ⱦ¼º, 2012³â 4¿ù 26ÀÏ-27ÀÏ, Poster |
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19 |
Joohwi Lee Seung-Cheol Lee, Cheol Seong Hwang, Jung-Hae Choi Á¦ÀÏ¿ø¸® °è»êÀ» ÀÌ¿ëÇÑ »êȾƿ¬ÁÖ¼®ÀÇ Á¡°áÇÔ Çü¼º ¹× À̵¿¿¡ °üÇÑ ¿¬±¸ 2012³âµµ ´ëÇѱݼÓÀç·áÇÐȸ Ãá°èÇмú´ëȸ, Çö´ë ¼º¿ì¸®Á¶Æ®, Ⱦ¼º, 2012³â 4¿ù 26ÀÏ-27ÀÏ, Oral |
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18 |
Gun Hwan Kim, Jong Ho Lee, Jeong Hwan Han, Seul Ji Song, Jun Yeong Seok,Jung Ho Yoon, Kyung Jean Yoon, Min Hwan Lee, Tae Joo Park, and Cheol Seong Hwang Cross bar resistive memory using TiO2 thin films Á¦19ȸ ¹ÝµµÃ¼Çмú´ëȸ, °í·Á´ëÇб³, 2012³â 2¿ù 15ÀÏ-17ÀÏ, Oral |
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17 |
Hyung-Suk Jung, Il-Hyuk Yu, Hyo Kyeom Kim, Sang Young Lee, Tae Joo Park, Nae-In Lee, Cheol Seong Hwang The effect of thermal budget on the insulating properties of HfO2 on Ge substrate Á¦19ȸ ¹ÝµµÃ¼Çмú´ëȸ, °í·Á´ëÇб³, 2012³â 2¿ù 15ÀÏ-17ÀÏ, Oral |
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16 |
Sang-Ho Rha, Jisim Jung, Un Ki Kim, Yoon Jang Chung, Eun Suk Hwang and Cheol Seong Hwang Temperature dependent mobility characteristics for the InGaZnOx thin film transistor Á¦19ȸ ¹ÝµµÃ¼Çмú´ëȸ, °í·Á´ëÇб³, 2012³â 2¿ù 15ÀÏ-17ÀÏ, Oral |
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