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25

Yeon Woo Yoo, Woojin Jeon, Woongkyu Lee, Jeong Hwan Han, and Cheol Seong Hwang

Comparison between Atomic Layer Deposited TiO2 Films on Various Substrates with Different Growth Temperature

ALD 2012, Dresden, Germany, June 17-20 (2012), Poster

24

Seul Ji Song, Gun Hwan Kim, Jun Yeong Seok, Kyung Jean Yoon, Julien Gatineau, and Cheol Seong Hwang

Substrate dependent growth behaviors of plasma-enhanced atomic layer deposition of NiO

ALD 2012, Dresden, Germany, June 17-20 (2012), Poster

23

Woojin Jeon, Hyo Kyeom Kim, Woongkyu Lee, Yeon Woo Yoo, Jeong Hwan Han, and Cheol Seong Hwang

Acheiving EOT of 4.0 ¡Ê from Al-doped TiO2 film with RuO2 Top Electrode

ALD 2012, Dresden, Germany, June 17-20 (2012), Poster

22

Hyo Kyeom Kim, Sang Young Lee, Il-Hyuk Yu, Jae Ho Lee, Tae Joo Park, and Cheol Seong Hwang

Scaling of equivalent oxide thickness using La-incorporated metal gates on ALD Hf1-xSixO2 gate dielectrics

ALD 2012, Dresden, Germany, June 17-20 (2012), Poster

21

Min Hyuk Park, Hyun Ju Lee, Gun Hwan Kim, Yu Jin Kim, Jeong Hwan Kim, Jong Ho Lee, and Cheol Seong Hwang

Novel tri-states memory using ferroelectric-insulator-semiconductor hetero-junctions for fifty percent increased data storage

WoDiM, Dresden, Germany, June 25-27 (2012)

20

Yoonsoo Jung, Sae-Jin Kim, Kyoung-Jin Choi, Seung-Cheol Lee, Cheol Seong Hwang and Jung-Hae Choi

Á¦ÀÏ¿ø¸® °è»êÀ» ÀÌ¿ëÇÑ SrTiO3 ±âÆÇ À§ÀÇ Epitaxial SrRuO3 ¹Ú¸·ÀÇ µÎ²²¿¡ µû¸¥ »óÀüÀÌ ¿¬±¸

2012³âµµ ´ëÇѱݼÓÀç·áÇÐȸ Ãá°èÇмú´ëȸ, Çö´ë ¼º¿ì¸®Á¶Æ®, Ⱦ¼º, 2012³â 4¿ù 26ÀÏ-27ÀÏ, Poster

19

Joohwi Lee Seung-Cheol Lee, Cheol Seong Hwang, Jung-Hae Choi

Á¦ÀÏ¿ø¸® °è»êÀ» ÀÌ¿ëÇÑ »êÈ­¾Æ¿¬ÁÖ¼®ÀÇ Á¡°áÇÔ Çü¼º ¹× À̵¿¿¡ °üÇÑ ¿¬±¸

2012³âµµ ´ëÇѱݼÓÀç·áÇÐȸ Ãá°èÇмú´ëȸ, Çö´ë ¼º¿ì¸®Á¶Æ®, Ⱦ¼º, 2012³â 4¿ù 26ÀÏ-27ÀÏ, Oral

18

Gun Hwan Kim, Jong Ho Lee, Jeong Hwan Han, Seul Ji Song, Jun Yeong Seok,Jung Ho Yoon, Kyung Jean Yoon, Min Hwan Lee, Tae Joo Park, and Cheol Seong Hwang

Cross bar resistive memory using TiO2 thin films

Á¦19ȸ ¹ÝµµÃ¼Çмú´ëȸ, °í·Á´ëÇб³, 2012³â 2¿ù 15ÀÏ-17ÀÏ, Oral

17

Hyung-Suk Jung, Il-Hyuk Yu, Hyo Kyeom Kim, Sang Young Lee,  Tae Joo Park, Nae-In Lee, Cheol Seong Hwang

The effect of thermal budget on the insulating properties of HfO2 on Ge substrate

Á¦19ȸ ¹ÝµµÃ¼Çмú´ëȸ, °í·Á´ëÇб³, 2012³â 2¿ù 15ÀÏ-17ÀÏ, Oral

16

Sang-Ho Rha, Jisim Jung, Un Ki Kim, Yoon Jang Chung, Eun Suk Hwang and Cheol Seong Hwang

Temperature dependent mobility characteristics for the InGaZnOx thin film transistor

Á¦19ȸ ¹ÝµµÃ¼Çмú´ëȸ, °í·Á´ëÇб³, 2012³â 2¿ù 15ÀÏ-17ÀÏ, Oral