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Hong Bae Park, Moonju Cho, Jaehoo Park, Suk Woo Lee, Cheol Seong Hwang, Jaehack Jeong The Adoption and Nitridation of Al2O3 Inter-layer for Improving Thermal Stability and Flat-band Behavior of HfO2 gate Dielectric Films Grown by Atomic Layer Deposition The 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, Oct 8-13 (2003)
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| 21 |
Y-S. Min, Y. J. Cho, S. Ha, J-H. Han, J-H. Lee, Y. S. Park, W. D. Kim, and C. S. Hwang Atomic Layer Deposition of Bismuth Titanium Silicon Oxide(BSTO) Thin Films for DRAM Capacitor Applications The 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, Oct 8-13 (2003)
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| 20 |
Doo Seok Jeong, Hong Bae Park, and Cheol Seong Hwang Comparative Study on Leakage Current Mechanism of Atomic-layer-deposited HfO2 Thin Films Using H2O or O3 as Oxidant The 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, Oct 8-13 (2003)
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| 19 |
M. Cho, H-B. Park, J. Park, S-W. Lee, C-S. Hwang, J. Jeong High-k Property and Reduced Interfacial Trap Density of HfO2 Gate Dielectric Films Grown by Atomic Layer Deposition Using Hf[N(CH3)2]4 Precursor and H2O The 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, Oct 8-13 (2003)
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| 18 |
Cheol Seong Hwang High-k HfO2 gate oxide for CMOS applications International Conference on Electroceramics, ICE-2003, Massachusetts 10th European Meeting on Ferroelectricity, Cambridge U.K., Aug 3-8 (2003)
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| 17 |
Cheol Seong Hwang thickness-dependent dielectric constants and electron transport of (Ba,Sr)TiO3 thin film capacitors having Pt and conducting oxide electrodes International Conference on Electroceramics, ICE-2003, Massachusetts Institute of Technology, Cambridge, Massachusetts, USA, Aug 3-7 (2003)
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Moonju Cho, Hong Bae Park, Jaehoo Park, Cheol Seong Hwang, Jong Cheol Lee, Se-Jung Oh, Jae Hak Jeong, Kwang Soo Hyun The Compositional And Structural Variations In HfO2/Al2O3 High-k Gate Dielectric Stacks Grown By Atomic-Layer-Deposition During Post-Annealing 15th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 9-12 (2003), Poster
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| 15 |
Jaehoo Park, Moonju Cho, Hong Bae Park, Cheol Seong Hwang, Geun Ho Kim, Bong Ok Joh, Cheol Ju Hwang Characterization Of HfO2 Thin Films Grown By MOCVD Using Tetrakis (1-Methoxy-2-methyl-2-propoxy) Hafnium 15th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 9-12 (2003), Poster
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| 14 |
In Sang Jeon, Dail Eom, Moonju Cho, Hong Bae Park, Jaehoo Park,Cheol Seong Hwang, Hyeong Joon Kim Study on Slow/Fast Interface States of Al2O3/Si MOS system using Deep Level Transient Spectroscopy 15th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 9-12 (2003), Poster
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| 13 |
Ji-Eun Lim, Dong-Yeon Park, Jae Kyeong Jeong, Kun Ho Ahn, Hyeong Joon Kim, Cheol Seong Hwang, Dong-Su Lee, Seung-Hyun Kim, Jowoong Ha Study On Crystal Structure Of (111)-Oriented Pt Films Using High Resolution X-Ray Diffractometer 15th International Symposium on Integrated Ferroelectrics, Colorado Springs, USA, March 9-12 (2003), Poster
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