| 35 |
Taeyoung Jeong, Kun Hee Ye, Seungjae Yoon, Dohyun Kim, Yunjae Kim, Cheol Seong Hwang, Jung-Hae Choi VacHopPy: Automating Effective Parameter Extraction for Vacancy-mediated Diffusion from Molecular Dynamics Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 34 |
Hyung Jeung Kim, Ghenzi Nestor, Shihyun Kim, and Cheol Seong Hwang Experimental Demonstration of Analog Multi-Level Operation in a 16¡¿16 2T0C Array Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 33 |
Chansoo Kwak, Heewon Paik, Sunoo Kim and Cheol Seong Hwang BaTiO3 Thin Films Grown by Atomic Layer Deposition Using a Seed Layer Process Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 32 |
Jea Min Cho, Sunwoo Cheong and Cheol Seong Hwang Monolithic 3D Integrated 1TnR Compute-in-Memory Array for Multi-layer Ising Solver Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 31 |
Dohyun Kim, Taeyoung Jeong, Seungjae Yoon, Yunjae Kim, Cheol Seong Hwang, and Jung-Hae Choi Metal-to-Insulator Transition in Rutile-based Polytypes of MO2 (M=V, Nb, Ta) by First-Principles Calculations Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 30 |
Hyun Young Kim, and Cheol Seong Hwang Impact of HfO2 back-channel resistive switching layer in scaled IGZO thin film transistors for parallel 1T-1R integration Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 29 |
Jonghoon Shin, Tae Kyun Kim, Heewon Paik, Haewon Song and Cheol Seong Hwang* High-Performance Dynamic Random Access Memory Capacitor with an Equivalent Oxide Thickness of 0.31 nm via Stepwise Cycling in Y-doped Hf0.5Zr0.5O2 Thin Films Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ (ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Oral |
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| 28 |
Hyun Min Kim, Kilhwa Pi and Cheol Seong Hwang
Enhancing Memory Window of Hf0.5Zr0.5O2-based Ferroelectric Field-Effect Transistors by Controlling Ozone Dose Time in Atomic Layer Deposition Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ(ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, poster |
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| 27 |
Seong Jae Shin, Min Jong Kim, Cheol Seong Hwang* Variations in the Ferroelectric Properties of Hf0.5Zr0.5O2 Depending on the Hafnium Nitride Electrode Conditions Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ (ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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| 26 |
Seong Jae Shin, Cheol Seong Hwang* Wake-Up-Free Ferroelectricity in Ultrathin (5 nm) Hf0.5Zr0.5O2 with Molybdenum Bottom Electrode Á¦ 33ȸ ¹ÝµµÃ¼Çмú´ëȸ, °¿øµµ ÇÏÀÌ¿ø ±×·£µåÈ£ÅÚ (ÄÁº¥¼ÇŸ¿ö), 2026³â 1¿ù 28-30ÀÏ, Poster |
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