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9

Cheol Jin Cho, Min-Jung Choi, Jin-Sang Kim,  Cheol Seong Hwang, and Seong Keun Kim

Influence of reduced Al-doping concentration with modified atomic layer deposition recipes on electrical properties of TiO2 films

Á¦ 22ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ÀÎõ ¼ÛµµÄÁº¥½Ã¾Æ, 2015³â 2¿ù 10ÀÏ-12ÀÏ, oral

8

Woojin Jeon, Sijung Yoo, Hyo Kyeom Kim, Woongkyu Lee, Cheol Hyun An, Min Jung Chung, and Cheol Seong Hwang

Evaluating the top electrode material for achieving an equivalent oxide thickness smaller than 0.4nm from an Al-doped TiO2 film

Á¦ 22ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ÀÎõ ¼ÛµµÄÁº¥½Ã¾Æ, 2015³â 2¿ù 10ÀÏ-12ÀÏ, oral

7

Taehong Gwon, Taeyong Eom, Sijung Yoo, Moo-Sung Kim, Lain Buchanan, Manchao Xiao, and Cheol Seong Hwang

Atomic Layer Deposition of chalcogenide novel Ge precursor

Á¦ 22ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ÀÎõ ¼ÛµµÄÁº¥½Ã¾Æ, 2015³â 2¿ù 10ÀÏ-12ÀÏ, oral

6

Taeyong Eom, Taehong Gwon, Sijung Yoo, Byung Joon Choi, Moo-Sung Kim, Lain Buchanan, Manchao Xiao, and Cheol Seong Hwang

Conformal Formation of Ge2Sb2Te5 film for phase change memories realized by controlling non-ideal behaviors of ALD

Á¦ 22ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ÀÎõ ¼ÛµµÄÁº¥½Ã¾Æ, 2015³â 2¿ù 10ÀÏ-12ÀÏ, oral

5

Han Joon Kim, Min Hyuk Park, Yu Jin Kim, Young Hwan Lee, Taehwan Moon, Keum Do Kim, and Cheol Seong Hwang

Ferroelectric Hf0.5Zr0.5O2 Thin Films with Al2O3 inter-layer as a Serial Resistor on Ferroelectric Switching

Á¦ 22ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ¼ÛµµÄÁº¥½Ã¾Æ, 2015³â 2¿ù 10ÀÏ-12ÀÏ, oral

4

Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Young Hwan Lee, and Cheol Seong Hwang

Thin HfxZr1-xO2 Films (x=0.1-0.4) for a Monolithic Device for Various Energy-related Applications

Á¦ 22ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ¼ÛµµÄÁº¥½Ã¾Æ, 2015³â 2¿ù 10ÀÏ-12ÀÏ, oral

3

H. J. Kim, M. H. Park, Y. J. Kim, T. Moon, K. D. Kim,  Y. H. Lee, and C. S. Hwang

Study on the wake-up phenomenon of ferroelectric Hf0.5Zr0.5O2 thin films by polarization switching and discharge behavior

Á¦ 11Â÷ °­À¯Àüü ¿¬Çսɯ÷Áö¾ö, ¹«ÁÖ¸®Á¶Æ®, 2015³â 2¿ù 1-3ÀÏ, poster

2

Y. J. Kim, M. H. Park, Y. H. Lee, H. J. Kim, W. Jeon, T. Moon, K. D. Kim,  D. S. Jeong, H. Yamada, and C. S. Hwang

A New Approach to the Negative Capacitance of Ferroelectric Thin Films

Á¦ 11Â÷ °­À¯Àüü ¿¬Çսɯ÷Áö¾ö, ¹«ÁÖ¸®Á¶Æ®, 2015³â 2¿ù 1-3ÀÏ, poster

1

M. H. Park, H. J. Kim, Y. J. Kim, T. Moon, K. D. Kim, Y. H. Lee, and C. S. Hwang

Antiferroelectric HfxZr1-xO2 thin films for the energy-related applications

Á¦ 11Â÷ °­À¯Àüü ¿¬Çսɯ÷Áö¾ö, ¹«ÁÖ¸®Á¶Æ®, 2015³â 2¿ù 1-3ÀÏ, oral