| 39 |
Young Hwan Lee RF Sputtering and Characterization of Ferroelectric Hf0.5Zr0.5O2 Films 1st International Symposium on Emerging Functional Materials, 송도 컨벤시아, November 4-6 (2015), poster
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| 38 |
Dong Gun Kim, Jae-Ho Lee, Hyun Jae Lee, Jung-Hae Choi and Cheol Seong Hwang Investigation of passivation layer effect on Ge substrate using SiO2/Al2O3 bi-layer Grown via Atomic Layer Deposition 1st International Symposium on Emerging Functional Materials, 송도 컨벤시아, November 4-6 (2015), poster
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| 37 |
Byung Joon Choi, Taeyong Eom, Cheol Seong Hwang Selective Growth of GeSbTe Phase-Changing Materials Utilizing Self-Aligned Confined Structure AVS 62nd International Symposium & Exhibition, San Jose Convention Center, San Jose, California, USA, October 18 – 23 (2015), oral
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| 36 |
Taeyong Eom, Taehong Gwon, Sijung Yoo, Moo-Sung Kim, Iain Buchanan, Sergei Ivanov, Manchao Xiao, and Cheol Seong Hwang Atomic layer deposition of Ge2Sb2Te5 thin films for phase change memories Atomic Layer Deposition: Russia 2015, September 20 - 21 (2015)
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| 35 |
Cheol Seong Hwang A Review of Three-dimensional Resistive Switching Cross-Bar Array Memories from the Integration and Materials Property Points of View The 21th National Conference of Information Storage 2015, September 17 - 20 (2015)
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| 34 |
Cheol Seong Hwang A Review of Three-dimensional Resistive Switching Cross-Bar Array Memories from the Integration and Materials Property Points of View IEEE NANO 2015, Rome, Italy, July 27-30 (2015) |
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| 33 |
U. Schroeder, T. Schenk, C. Richter, M. Hoffmann, R. Materlik, A. Kersch, Min Hyuk Park, Cheol Seong Hwang and T. Mikolajick Ferroelectric HfO2 for Novel Semiconductor Devices ALD 2015, Hilton Hotel, Portland, USA, June 28 - July 1 (2015), oral
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| 32 |
Cheol Jin Cho, Woo Chul Lee, Jin-Sang Kim, Cheol Seong Hwang and Seong Keun Kim Abnormal grain growth of as-grown TiO2 films by inserting of Al2O3 interlayer ALD 2015, Hilton Hotel, Portland, USA, June 28 - July 1 (2015), poster
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| 31 |
Cheol Jin Cho, Woo Chul Lee, Jin-Sang Kim, Cheol Seong Hwang and Seong Keun Kim Influence of Reduced Al-Doping Concentration with Modified Atomic Layer Deposition Recipes on Electrical Properties of TiO2 Films ALD 2015, Hilton Hotel, Portland, USA, June 28 - July 1 (2015), poster
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| 30 |
Dong Gun Kim, Jae-Ho Lee, Hyun Jae Lee, Woo Jin Jeon, Jung-Hae Choi and Cheol Seong Hwang Investigation of passivation layer effect on Ge substrate using SiO2/Al2O3 bi-layer Grown via Atomic Layer Deposition ALD 2015, Hilton Hotel, Portland, USA, June 28 - July 1 (2015), poster
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