29 |
Joohwi Lee, Seung-Cheol Lee, Cheol Seong Hwang and Jung-Hae Choi Structural, electronic, and thermodynamic properties of inverse spinel phase Zn2SnO4 ai-WISE, Rinberg Castle, Germany, Oct. 23-26 (2011), Poster |
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28 |
Hyung-Suk Jung, Joohwi Lee, Hyo Kyeom Kim, Sang Young Lee, Nae-In Lee, and Cheol Seong Hwang The impact of ALD grown SiOxNy and AlOxNy passivation layers on the electrical properties of metal gate/high-k Ge MOS capacitors International Symposium on Integrated Functionalities(ISIF) 2011, Cambridge, July 31-August 4 (2011), Oral |
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27 |
Hyo Kyeom Kim, Hyung-Suk Jung, Jae Hyuck Jang, Sang Young Lee, Cheol Seong Hwang The influence of different types of La-incorporated TiN metal gate stacks on HfO2 ; TiN/La/TiN and TiLaN International Symposium on Integrated Functionalities(ISIF) 2011, Cambridge, July 31-August 4 (2011), Oral |
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26 |
Kyung Jean Yoon, Seul Ji Song, Kyung Min Kim, Min Hwan Lee, Gun Hwan Kim ,Jun Yeong Seok, Jung Ho Yoon, and Cheol Seong Hwang Memristive Switching utilizing the bipolar resistive switching in Titanium dioxide International Symposium on Integrated Functionalities(ISIF) 2011, Cambridge, July 31-August 4 (2011), Poster |
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25 |
Jung Ho Yoon, Kyung Min Kim, Min Hwan Lee, Seong Keun Kim, Ji Sim Jung, Gun Hwan Kim, Seul Ji Song, Jun Yeong Seok, and Cheol Seong Hwang Role of Ru nano-dots embedded in TiO2 thin films for improving the resistive switching behavior International Symposium on Integrated Functionalities(ISIF) 2011, Cambridge, July 31-August 4 (2011), Oral |
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24 |
Min Hyuk Park, Hyun Ju Lee, Yu Jin Kim, and Cheol Seong Hwang Novel Diode-Embedded Ferroelectric Resistive Memory for Crossbar Array Application ISAF-PFM-2011, Vancouver, July 24-27 (2011), Poster |
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23 |
Cheol Seong Hwang, Kyung Min Kim, Seul Ji Song, Gun Hwan Kim, Jun Yeong Seok, Min Hwan Lee, Jung Ho Yoon, and Jucheol Park Collective motion of nano-filaments in Pt/n-type TiO2/p-type NiO/Pt stacked resistance switching memory ISAF-PFM-2011, Vancouver, July 24-27 (2011) |
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22 |
Cheol Seong Hwang New directions, ideas or trends in ALD ALD 2011, Cambridge, June 26~29 (2011) |
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21 |
Seul Ji Song, Gun Hwan Kim, Jun Yeong Seok, Jung Ho Yoon, Kyung Jean Yoon, Julien Gatineau and Cheol Seong Hwang Plasma enhanced atomic layer deposition of NiO thin films for resistive switching memory device ALD 2011, Cambridge, June 26~29 (2011), Poster |
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20 |
Sang Young Lee, Woongkyu Lee, Hyung-Suk Jung, Hyo Kyeom Kim and Cheol Seong Hwang The effects of ALD grown HfO2 and TiO2/passivation layer stacks on the electrical properties of metal gate/high-k Ge MOS capacitors ALD 2011, Cambridge, June 26~29 (2011), Poster |
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