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Yong Cheol Shin, Kyung-Min Kim, Byung Joon Choi, Seol Choi, and Cheol Seong Hwang Analysis of Resistive Switching of TiO2 focused on Current Compliance Using Conductive Atomic Force Microscopy Á¦ 14ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ·Ôµ¥È£ÅÚ Á¦ÁÖ, February 8-9 (2007) |
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À̱Ù, ÀÌÇöÁÖ, Ȳö¼º Influence of In-situ Surface Treatment of Ir Electrode before MOCVD-PZT Film Growth on the Self-Regulation Process Window Á¦ 14ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ·Ôµ¥È£ÅÚ Á¦ÁÖ, February 8-9 (2007) |
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ÀÌÇöÁÖ, ±è¼º±Ù, À̱Ù, Ȳö¼º Influence of Al2O3 Hydrogen Barrier on the Ferroelectric Switching Behavior of Pb(Zr,Ti)O3 Thin Film Capacitor Á¦ 14ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ·Ôµ¥È£ÅÚ Á¦ÁÖ, February 8-9 (2007) |
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¼¹ÎÇÏ, ±è¼º±Ù, ¹ÚÅÂÁÖ, ±èÁ¤È¯, Ȳö¼º Hf([N(CH3)(C2H5)]3[OC(CH3)3]) Àü±¸Ã¼¿Í O3»êÈÁ¦¸¦ ÀÌ¿ëÇÏ¿© ALD¹æ¹ýÀ¸·Î ÁõÂøÇÑ HfO2 À¯Àü ¹Ú¸·ÀÇ ¹°¸®Àû, Àü±âÀû Ư¼º ¹× ¿Àû ¾ÈÁ¤¼º ¿¬±¸ Á¦ 14ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ·Ôµ¥È£ÅÚ Á¦ÁÖ, February 8-9 (2007) |
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±èÁ¤È¯, ¹ÚÅÂÁÖ, Á¶¹®ÁÖ, ¼¹ÎÇÏ, Ȳö¼º, ¿øÁ¤¿¬ ¿øÀÚÃþÁõÂø¹ý¿¡ ÀÇÇÑ HfO2 ¹Ú¸· ÁõÂø ½Ã NH3 ÷°¡¿¡ µû¸¥ ¹Ú¸·ÀÇ ½Å·Ú¼º °³¼± Á¦ 14ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, ·Ôµ¥È£ÅÚ Á¦ÁÖ, February 8-9 (2007) |
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