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Gyu Weon Hwang, Wan Don Kim, Cheol Seong Hwang, Yo-Sep Min, and Young Jin Cho Atomic Layer Deposition of Amorphous Bi2Ti2O7 Thin Films for Capacitor Dielectric Applications The 13th Korean Conference on Semiconductors, Ramada Plaza Hotel, Jeju, Korea, February 23-24 (2006) |
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| 5 |
S.Y.No, D.Eom, C.S.Hwang, and H.J.Kim Electrical Characterization of Lanthanum Oxide Thin Films Deposited Using La(iPrCp)3 and H2O The 13th Korean Conference on Semiconductors, Ramada Plaza Hotel, Jeju, Korea, February 23-24 (2006) |
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| 4 |
이상운, 권오성, 황철성 Characterization of SrTiO3 Thin Films by Atomic Layer Deposition Using Conventional Metal-Organic Precursors and H2O based Oxidant The 13th Korean Conference on Semiconductors, Ramada Plaza Hotel, Jeju, Korea, February 23-24 (2006) |
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| 3 |
Byung Joon Choi, Kyung Min Kim, Sul Choi, Bon Wook Koo, Seong Keun Kim, and Cheol Seong Hwang Electrical Pulse Induced Resistance Switching Phenomena in the TiO2 Thin Films The 13th Korean Conference on Semiconductors, Ramada Plaza Hotel, Jeju, Korea, February 23-24 (2006) |
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| 2 |
B.S.Kim, H.S.Seo, C.S.Hwang, H.J.Kim, J.Y.Kim, K.H.Lee, H.J.Lim, C.Y.Yoo, and S.T.Kim Deposition Characteristics of Ru Thin Films Grown by Metalorganic Chemical Vapor Deposition Using (2,4-dimethylpentadienyl) (ethylcyclopentadienyl) Ruthenium The 13th Korean Conference on Semiconductors, Ramada Plaza Hotel, Jeju, Korea, February 23-24 (2006) |
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| 1 |
서민하, 김성근, 김경민, 박태주, 김정환, 황철성, 조호진 Hf([N(CH3)(C2H5)]3[OC(CH3)3]) 전구체와 O3 산화제를 이용하여 ALD 방법으로 증착한 HfO2 유전박막의 결정화 특성 연구 The 13th Korean Conference on Semiconductors, Ramada Plaza Hotel, Jeju, Korea, February 23-24 (2006) |
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