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3

Seong Keun Kim, Wan Don Kim, and Cheol Seong Hwang

Atomic Layer Deposition of Titanium Oxide Thin Films sing O3 for MIM Capacitor of Next Generation Memory Devices

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2

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A Comparison of Different Initial Growth Behavior of Lead Oxide Thin Film on Pt and Ir Substrates by Liquid Delivery MOCVD

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1

B. J. Choi, D. S. Jung, S. K. Kim, S. Choi, J. H. Oh, C. Rohde, H. J. Kim, C. S. Hwang, R. Waser, B. Reichenberg, S. Tiedke

Resistive switching mechanism of TiO2 thin films grown by atomic-layer-deposition

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