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Jin Shi Zhao, Joon Seop Sim, Hyun Ju Lee, Dong-Yeon Park, and Cheol Seong Hwang A Study On The Deposition Behavior Of A Lead Oxide Thin Film On Pt And Ir Substrates By Liquid Delivery Metal-Organic Chemical Vapor Deposition For Pb(Zr,Ti)O3 Film Growth The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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22 |
Jaehoo Park, Moonju Cho, Seong Keun Kim, Tae Joo Park, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang The Influence Of The Oxygen Concentration Of Atomic-Layer-Deposited HfO2 Films On The Dielectric Property And Interface Trap Density The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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21 |
Chi Hoon Lee, Jaehoo Park, Cheol Seong Hwang and Hyeong Joon Kim Investigation of Nitrogen in-situ incorporated Al2O3 Layer using ALD with P+ Polycrystalline-Silicon Germanium Gate The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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20 |
Suk Woo Lee, Sug Hun Hong, Jaehoo Park, Moonju Cho, Tae Joo Park, and Cheol Seong Hwang Fabrication Of HfO2 Thin Film Capacitors With A Polycrystalline Si Gate Electrode And A Low Interface Trap Density The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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19 |
Seong Keun Kim, Wan-Don Kim, Kyung-Min Kim, and Cheol Seong Hwang High-Dielectric-Constant TiO2 Thin Films On A Ru Electrode Grown At 250oC By Atomic-Layer Deposition The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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18 |
Gyu Weon Hwang, Wan Don Kim, and Cheol Seong Hwang, Yo-Sep Min, Young Jin Cho, and Jeong-Hee Han Atomic Layer Deposition Of Bi2(Ti2-xSix)O7-y Thin Films For Capacitor Dielectric Applications The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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17 |
B. J. Choi, D. S. Jeong, S. K. Kim, S. Choi, J. H. Oh, C. Rohde, H. J. Kim, C. S. Hwang, R. Waser, B. Reichenberg, S. Tiedke Resistive Switching Mechanism Of TiO2 Thin Films Grown By Atomic-Layer-Deposition The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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16 |
Moonju Cho, Doo Seok Jeong, Jaehoo Park, Hong Bae Park, Suk Woo Lee, Tae Joo Park, and Cheol Seong Hwang Comparison Between Atomic-Layer-Deposited HfO2 FIlMS Using O3 Or H2O Oxidant And Hf[N(CH3)2]4 Precursor The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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15 |
Woo Young Park and Cheol Seong Hwang Film-Thickness-Dependent Curie-Weiss Behavior And Interfacial Capacitance Of Sputtered (Ba,Sr)TiO3 Thin-Film Capacitors Having Pt Electrodes The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005) |
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14 |
Kyung-Min Kim, Byung Joon Choi, Seong Keun Kim, and Cheol Sung Hwang Fabrication of a metal-oxide-semiconductor-type capacitive micro-tip array using HfO2 gate insulators Á¦ 12ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ, Coex, 2005³â 2¿ù 24ÀÏ-25ÀÏ |
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