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23

Jin Shi Zhao, Joon Seop Sim, Hyun Ju Lee, Dong-Yeon Park, and Cheol Seong Hwang

A Study On The Deposition Behavior Of A Lead Oxide Thin Film On Pt And Ir Substrates By Liquid Delivery Metal-Organic Chemical Vapor Deposition For Pb(Zr,Ti)O3 Film Growth

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

22

Jaehoo Park, Moonju Cho, Seong Keun Kim, Tae Joo Park, Suk Woo Lee, Sug Hun Hong, and Cheol Seong Hwang

The Influence Of The Oxygen Concentration Of Atomic-Layer-Deposited HfO2 Films On The Dielectric Property And Interface Trap Density

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

21

Chi Hoon Lee, Jaehoo Park, Cheol Seong Hwang and Hyeong Joon Kim

Investigation of Nitrogen in-situ incorporated Al2O3 Layer using ALD with P+ Polycrystalline-Silicon Germanium Gate

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

20

Suk Woo Lee, Sug Hun Hong, Jaehoo Park, Moonju Cho, Tae Joo Park, and Cheol Seong Hwang

Fabrication Of HfO2 Thin Film Capacitors With A Polycrystalline Si Gate Electrode And A Low Interface Trap Density

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

19

Seong Keun Kim, Wan-Don Kim, Kyung-Min Kim, and Cheol Seong Hwang

High-Dielectric-Constant TiO2 Thin Films On A Ru Electrode Grown At 250oC By Atomic-Layer Deposition

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

18

Gyu Weon Hwang, Wan Don Kim, and Cheol Seong Hwang, Yo-Sep Min, Young Jin Cho, and Jeong-Hee Han

Atomic Layer Deposition Of Bi2(Ti2-xSix)O7-y Thin Films For Capacitor Dielectric Applications

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

17

B. J. Choi, D. S. Jeong, S. K. Kim, S. Choi, J. H. Oh, C. Rohde, H. J. Kim, C. S. Hwang, R. Waser, B. Reichenberg, S. Tiedke

Resistive Switching Mechanism Of TiO2 Thin Films Grown By Atomic-Layer-Deposition

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

16

Moonju Cho, Doo Seok Jeong, Jaehoo Park, Hong Bae Park, Suk Woo Lee, Tae Joo Park, and Cheol Seong Hwang

Comparison Between Atomic-Layer-Deposited HfO2 FIlMS Using O3 Or H2O Oxidant And Hf[N(CH3)2]4 Precursor

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

15

Woo Young Park and Cheol Seong Hwang

Film-Thickness-Dependent Curie-Weiss Behavior And Interfacial Capacitance Of Sputtered (Ba,Sr)TiO3 Thin-Film Capacitors Having Pt Electrodes

The 17th International Symposium on Integrated Ferroelectrics, Hotel Equatorial, Shanghi, China, April 17-20 (2005)

14

Kyung-Min Kim, Byung Joon Choi, Seong Keun Kim, and Cheol Sung Hwang

Fabrication of a metal-oxide-semiconductor-type capacitive micro-tip array using HfO2 gate insulators

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