17 |
Byoung Taek Lee, Cheol Seong Hwang Methods of forming floating-gate FFRAM devices ¹Ì±¹, 05940705, 1997. 11. 19.
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16 |
Young Soh Park, Sang In Lee, Cheol Seong Hwang, Doo Sup Hwang, Hag Ju Cho Methods of forming integrated circuit capacitors using metal reflow techniques ¹Ì±¹, 06001660, 1997. 11. 13.
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15 |
Cheol Seong Hwang, Choon Ho Lee Ferroelectric structure including MgTiO3 passivation ¹Ì±¹, 05834804, 1997. 10. 16.
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14 |
Jin Won Kim, Cheol Seong Hwang, Sang In Lee Dual deposition methods for forming contact metallizations, capacitors, and memory devices ¹Ì±¹, 05918118, 1997.09.16.
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13 |
Cheol Seong Hwang, Byoung Taek Lee Microelectronic devices including ferroelectric capacitors with lower electrodes extending into contact holes ¹Ì±¹, 06180970, 1997. 08. 12.
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12 |
Ȳö¼º ¹ÝµµÃ¼ ¸Þ¸ð¸® ¼ÒÀÚÀÇ Á¦Á¶¹æ¹ý ´ëÇѹα¹, 10-0475018, 1997. 12. 22.
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11 |
Ȳö¼º Method of fabricating capacitor structures for inclusion withinsemiconductor devices ¹Ì±¹, 05696015, 1997. 12. 09.
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10 |
Ȳö¼º ¹ÝµµÃ¼ ¸Þ¸ð¸® ÀåÄ¡ÀÇ Ä³ÆнÃÅÍ Á¦Á¶ ¹æ¹ý ´ëÇѹα¹, 10-0268415, 1997. 10. 01.
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9 |
È£¸®ÀÌ È÷µ¥³¢, Ȳö¼º µµÀü¼º È®»êÀ庮ÃþÀ» »ç¿ëÇÏ´Â ¹ÝµµÃ¼ ÀåÄ¡ Á¦Á¶¹æ¹ý ´ëÇѹα¹, 10-0269310, 1997. 09. 29.
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8 |
Ȳö¼º ¹é±ÝÀ» Àü±ØÀ¸·Î »ç¿ëÇÏ´Â ¹ÝµµÃ¼ ÀåÄ¡ÀÇ Ä¿ÆнÃÅÍ ´ëÇѹα¹ ƯÇã(°ø°³), 1997-24218, 1997. 05. 30.
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