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17

Byoung Taek Lee, Cheol Seong Hwang

Methods of forming floating-gate FFRAM devices

¹Ì±¹, 05940705, 1997. 11. 19.

16

Young Soh Park, Sang In Lee, Cheol Seong Hwang, Doo Sup Hwang, Hag Ju Cho

Methods of forming integrated circuit capacitors using metal reflow techniques

¹Ì±¹, 06001660, 1997. 11. 13.

15

Cheol Seong Hwang, Choon Ho Lee

Ferroelectric structure including MgTiO3 passivation

¹Ì±¹, 05834804, 1997. 10. 16.

14

Jin Won Kim, Cheol Seong Hwang, Sang In Lee

Dual deposition methods for forming contact metallizations, capacitors, and memory devices

¹Ì±¹, 05918118, 1997.09.16.

13

Cheol Seong Hwang, Byoung Taek Lee

Microelectronic devices including ferroelectric capacitors with lower electrodes extending into contact holes

¹Ì±¹, 06180970, 1997. 08. 12.

12

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¹ÝµµÃ¼ ¸Þ¸ð¸® ¼ÒÀÚÀÇ Á¦Á¶¹æ¹ý

´ëÇѹα¹, 10-0475018, 1997. 12. 22.

11

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Method of fabricating capacitor structures for inclusion withinsemiconductor devices

¹Ì±¹, 05696015, 1997. 12. 09.

10

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¹ÝµµÃ¼ ¸Þ¸ð¸® ÀåÄ¡ÀÇ Ä³ÆнÃÅÍ Á¦Á¶ ¹æ¹ý

´ëÇѹα¹, 10-0268415, 1997. 10. 01.

9

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µµÀü¼º È®»êÀ庮ÃþÀ» »ç¿ëÇÏ´Â ¹ÝµµÃ¼ ÀåÄ¡ Á¦Á¶¹æ¹ý

´ëÇѹα¹, 10-0269310, 1997. 09. 29.

8

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¹é±ÝÀ» Àü±ØÀ¸·Î »ç¿ëÇÏ´Â ¹ÝµµÃ¼ ÀåÄ¡ÀÇ Ä¿ÆнÃÅÍ

´ëÇѹα¹ ƯÇã(°ø°³), 1997-24218, 1997. 05. 30.