| 년도 |
내용 |
자료 |
| 2021 |
Dae Seon Kwon, Woojin Jeon, Dong Gun Kim, Tae Kyun Kim, Haengha Seo, Junil Lim, and Cheol Seong Hwang*; Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method; ACS Applied Materials & Interfaces, 13, 23915-23927 (2021)
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| 2021 |
Dong Gun Kim, Hae-Ryoung Kim, Dae Seon Kwon, Junil Lim, Haengha Seo, Tae Kyun Kim, Heewon Paik, Woongkyu Lee and Cheol Seong Hwang*; Comparison of high-k Y2O3/TiO2 bilayer and Y-doped TiO2 thin films on Ge substrate; J. Phys. D: Appl. Phys., 54, 185110 (2021)
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| 2021 |
Dong Gun Kim, Dae Seon Kwon, Junil Lim, Haengha Seo, Tae Kyun Kim, Woongkyu Lee and Cheol Seong Hwang*; Trap Reduction through O3 Post‐Deposition Treatment of Y2O3 Thin Films Grown by Atomic Layer Deposition on Ge Substrates; Advanced Electronic Materials, 202000819 (2021)
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