| 18 |
Gil Seop Kim, Tae Hyung Park, Hae Jin Kim, Tae Jung Ha, Woo Young Park, Soo Gil Kim, and Cheol Seong Hwang Investigation of the retention performance of an ultra-thin HfO2 resistance switching layer in an integrated memory device Journal of Applied Physics, 124, 024102 (2018) |
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| 17 |
Woohyun Kim, Sijung Yoo, Chanyoung Yoo, Eui-Sang Park, Jeongwoo Jeon, Young Jae Kwon, Kyung Seok Woo, Han Joon Kim, Yoon Kyeung Lee* and Cheol Seong Hwang* Atomic layer deposition of GeSe films using HGeCl3 and [(CH3)3Si]2Se with the discrete feeding method for the ovonic threshold switch Nanotechnology, 29, 365202 (2018)
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| 16 |
Zi Long Bai, Xiao Xing Cheng, Dong Fang Chen, David Wei Zhang, Long-Qing Chen, James F. Scott, Cheol Seong Hwang,* and An Quan Jiang* Hierarchical Domain Structure and Extremely Large Wall Current in Epitaxial BiFeO3 Thin Films Adv. Funct. Mater., 28, 31, 1801725 (2018) |
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| 15 |
Won-Mook Kang, Sung Tae Lee, In-Tak Cho, Tae Hyung Park, Hyeonwoo Shin, Cheol Seong Hwang, Changhee Lee, Byung-Gook Park, Jong-Ho Lee, Multi-layer WSe 2 field effect transistor with improved carrier-injection contact by using oxygen plasma treatment Solid State Electronics, 140, 2-7 (2018) |
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| 14 |
Cheol Seong Hwang† and Bernard Dieny† Advanced memory—Materials for a new era of information technology MRS BULLETIN, 43, 330-333 (2018) |
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| 13 |
Woo Chul Lee, Cheol Jin Cho, Suk-In Park, Dong-Hwan Jun, Jin Dong Song, Cheol Seong Hwang, Seong Keun Kim Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer deposition Current Applied Physics, 18, 919-923(2018)
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| 12 |
Doo Seok Jeong and Cheol Seong Hwang Nonvolatile Memory Materials for Neuromorphic Intelligent Machines Advanced Materials, 30, 42, 1704729 (2018) |
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| 11 |
Sijung Yoo†, Chanyoung Yoo†, Eui-Sang Park, Woohyun Kim, Yoon Kyeung Lee* and Cheol Seong Hwang* Chemical Interactions in Atomic Layer Deposition of Ge-Sb-Se-Te Films and Their Ovonic Threshold Switching Behavior J. Mater. Chem. C., 6, 5025-5032 (2018) |
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| 10 |
Min Jung Chung†, Woojin Jeon†, Cheol Hyun An, Sang Hyeon Kim, Yoon Kyeong Lee, Woongkyu Lee*, and Cheol Seong Hwang*, Quantitative Analysis of the Incorporation Behaviors of Sr and Ti Atoms During the Atomic Layer Deposition of SrTiO3 Thin Films ACS Appl. Mater. Interfaces, 10, 10, 8836-8844 (2018) |
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| 9 |
Eun Suk Hwang, Jun Shik Kim, Seok Min Jeon, Seung Jun Lee, Younjin Jang, Deok-Young Cho, Cheol Seong Hwang, In2Ga2ZnO7 oxide semiconductor based charge trap device for NAND flash memory Nanotechnology, 29, 155203 (2018) |
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| 8 |
Anna G Chernikova, Maxim G Kozoaev, Dmitry V Negrov, Min Hyuk Park, Uwe Schroeer, Cheol Seong Hwang, Andrey M Markeev, Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2 Thin Films ACS Appl Mater. Interfaces, 10, 3, pp 2701-2708 (2018) |
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| 7 |
Woojin Jeon, Youngjin Kim, Cheol Hyun An, Cheol Seong Hwang, Patrice Gonon, and Christophe Vallée Demonstrating the Ultrathin Metal-Insulator-Metal Diode Using TiN/ZrO2-Al2O3-ZrO2 Stack by Employing RuO2 Top Electrode IEEE TRANSACTION ON ELECTRON DEVICES, 65, 2, 660-666 (2018) |
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| 6 |
Jung Ho Yoon, Zhongrui Wang, Kyung Min Kim, Huaqiang Wu, Vignesh Ravichandran, Qiangfei Xia, Cheol Seong Hwang & J. Joshua Yang An artificial nociceptor based on a diffusive memristor nature communication, DOI: 10.1038/s41467-017-02572-3 (2018) |
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| 5 |
Seung Jun Lee, Younjin Jang, Han Joon Kim, Eun Suk Hwang, Seok Min Jeon, Jun Shik Kim, Taehwan Moon, Kyung-Tae Jang, Young-Chang Joo, Deok-Yong Cho, and Cheol Seong Hwang* Composition, Microstructure, and Electrical Performance of Sputtered SnO Thin Films for p-Type Oxide Semiconductor ACS Appl. Mater. Interfaces, 10, 3810 (2018)
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| 4 |
Yumin Kim, Young Jae Kwon, Dae Eun Kwon, Kyung Jean Yoon, Jung Ho Yoon, Sijung Yoo, Hae Jin Kim, Tae Hyung Park, Jin-Woo Han, Kyung Min Kim,* and Cheol Seong Hwang* Nociceptive Memristor Advanced Materials, 30, 8, 1704320 (2018)
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| 3 |
Jinshi Zhao, Ming Zhang, Shangfei Wan, Zhengchun Yang*, and Cheol Seong Hwang* Highly Flexible Resistive Switching Memory Based on the Electronic Switching Mechanism in the Al/TiO2/Al/Polyimide Structure ACS Appl. Mater. Interfaces, DOI: 10.1021/acsami.7b16214 (2018) |
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| 2 |
Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Seung Dam Hyun, Thomas Mikolajick, Uwe Schroeder, and Cheol Seong Hwang Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films Nanoscale, 10, 716-725 (2018)
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| 1 |
Myeong-Lok Seol, Jin-Woo Han, Dong-Il Moon, Kyung Jean Yoon, Cheol Seong Hwang, M. Meyyappan All-printed triboelectric nanogenerator Nano Energy, 44, 82-88 (2018)
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