| 7 |
Seong Keun Kim, Gyu-Jin Choi, Sang Young Lee, Minha Seo, Sang Woon Lee, Jeong Hwan Han, Hyo-Shin Ahn, Seungwu Han, and Cheol Seong Hwang Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors Advanced Materials, 20, 1429-1435 (2008) |
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| 6 |
Woo Young Park, Cheol Seong Hwang*, John D. Baniecki*, Masatoshi Ishii,Kazuaki Kurihara, and Kazunori Yamanaka Unusual thickness dependence of permittivity and elastic strain in Sc modified epitaxial (Ba,Sr)TiO3 thin films Applied Physics Letters, 92, 102902 (2008) |
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| 5 |
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Cheol Seong Hwang and Jeong Ho Yoo Influence of Phase Separation on Electrical Properties of ALD Hf–Silicate Films with Various Si Concentrations Electrochemical and Solid-State Letters, 5, 11, H121-H123 (2008) |
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| 4 |
Bora Lee, Choong-Ki Lee, Seungwu Han, Jaichan Lee, and Cheol Seong Hwang First-principles calculation of capacitance including interfacial effects Journal of Applied Physics, 103, 024106 (2008) |
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| 3 |
M. Schindler, S. K. Kim, C. S. Hwang, C. Schindler, A. Offenhäusser, and S. Ingebrandt Novel post-process for the passivation of a CMOS biosensor Physica Status Solidi (RRL) - Rapid Research Letters, 1, 2, 4–6 (2008) |
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| 2 |
Seong Keun Kim and Cheol Seong Hwang Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates Electrochemical and Solid-State Letters, 3, 11, G9-G11 (2008) |
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| 1 |
Jaeyeong Heo, Sang Young Lee, Dail Eom, Cheol Seong Hwang* and Hyeong Joon Kim* Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O3 Treatment Electrochemical and Solid-State Letters, 2, 11, G5-G8 (2008) |
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