6 |
Seong Keun Kim, Suk Woo Lee, Cheol Seong Hwang, Yo-Sep Min, Jeong Yeon Won, and Jaehack Jeong Low Temperature (<100¡ÆC) Deposition of Aluminum Oxide Thin Films by ALD with O3 as Oxidant Journal of The Electrochemical Society, 5, 153, F69-F76 (2006) |
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5 |
Chihoon Lee, Jaehoo Park, Moonju Cho, Sug Hun Hong, Cheol Seong Hwang, Hyeong Joon Kim, and Jaehack Jeong Dopant Penetration Behavior of B-Doped P+ Polycrystalline-Si0.73Ge0.27/Al2O3 or AlN–Al2O3/n-Si Metal Insulator Semiconductor Capacitors Electrochemical and Solid-State Letters, 3, 9, G84-G86 (2006) |
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4 |
Jin Shi Zhao, Joon Seop Sim, Hyun Ju Lee, Dong-Yeon Park, and , Cheol Seong Hwang Investigation of the Deposition Behavior of a Lead Oxide Thin Film on Ir Substrates by Liquid Delivery Metallorganic Chemical Vapor Deposition Electrochemical and Solid-State Letters, 2, 9, C29-C31 (2006) |
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3 |
Gyu Weon Hwang, Wan Don Kim, Yo-Sep Min, Young Jin Cho, and Cheol Seong Hwang Characteristics of Amorphous Bi2Ti2O7 Thin Films Grown by Atomic Layer Deposition for Memory Capacitor Applications Journal of The Electrochemical Society, 1, 153, F20-F26 (2006) |
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2 |
Byung Seok Oh, Yo-Sep Min, Eun Ju Bae, Donghun Kang, In Sun Jung, Cheol Seong Hwang Fabrication of suspended single-walled carbon nanotubes via a direct lithographic route Journal of Material Chemistry, 16, 174 (2006) |
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1 |
Seong Keun Kim, Gyu Weon Hwang, Wan-Don Kim, and Cheol Seong Hwang Transformation of the Crystalline Structure of an ALD TiO2 Film on a Ru Electrode by O3 Pretreatment Electrochemical and Solid-State Letters, 1, 9, F5-F7 (2006) |
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