| 2021 |
Beom Yong Kim, Hyeon Woo Park, Seung Dam Hyun, Yong Bin Lee,Suk Hyun Lee, Minsik Oh, Seung Kyu Ryoo, In Soo Lee, Seungyong Byun, Doosup Shim,Deok-Yong Cho, Min Hyuk Park,* and Cheol Seong Hwang*, Enhanced Ferroelectric Properties in Hf0.5Zr0.5O2 Films
Using a HfO0.61N0.72 Interfacial Layer, Adv. Electron. Mater. 2021, 2100042
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| 2020 |
Beom Yong Kim, Baek Su Kim,Seung Dam Hyun, Ho Hyun Kim, Yong Bin Lee, Hyun Woo Park,Min Hyuk Park*, and Cheol Seong Hwang*, Study of ferroelectric characteristics of Hf0.5Zr0.5O2 thin films grown on sputtered or atomic-layerdeposited TiN bottom electrodes, Appl. Phys. Lett. 117, 022902 (2020)
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