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Sputtering Targets & Materials
핵심부품 개발, 실험 및 응용에 사용되는 고순도, Extra High Density & Purity의 다양한
Sputtering Target과 Evaporation Material의 종류입니다.
1. Single Crystal Targets :
Al2O3, LaAlO3, LN, LT, MgO, YSZ, BaF2, CaF2, SrTiO3, Si, GaP...........등.....등
1"~8", 4N, 100%, CZ, Arc, Vemue, Hydrothermal, Cool Crucible, Brigeman
2. Pure Elements Targets :
Ag, Al, Au, Be, Bi, C, Cd, Cr, Cu, Fe, Mg, Nb, Ni, Pt, Si, Ta, Ti, W, V, Zn, Zr 등
2N5~5N, Cast, PM, Pyrolytic......등............
3. Compound Targets :
Al2O3, BaTiO3, SrTiO3, CeO2, CuO, MgO, TiO2, YSZ, AN, BN, GaN, SiC, TiC...등
99.99%, Diameter :2"~3" Thickness : 0.125", 0,25" ........등............
4. Alloy Targets :
Al-Si-Cu, Co-Cr-Pt, Al-Ti, Co-Cr-Pt, Co-Ni-Cr, In-Sn, Mn-Ni, Ni-Al, Cr, Fe...등
3N~5N, 100%, Cast,........등.....................
5. 특징: * 주문스펙 가능 *소량, 다품종 주문 가능 * 가격경쟁력. 납기
*관련 실험기자재 및 종목 취급 * 구하기 어려웠던 아이템의 모든 것
6. Nano Ceramic Powders :
Al2O3, C, Si, Si3N4, B-SiC, YAG, SiO2, TiO2, ZrO...........등......
99.99%, 30nm~100nm, Crystalline alpha, rapid, Amorphous, Laser/Plasma/Sol-Gel
Wafer World. 서울테크 / E-mail:stiseoul@hanmail.net
H/P: TEL:02-790-2772(직통) FAX:02-790-1830
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