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Facility
[Deposition] Sputter system for IGZO, ZnO & ZTO
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2016-03-28 17:10:27
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675
Á¦ÀÛȸ»ç : Sorona Inc
¸ðµ¨¸í : SRN-120
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-Max 4 different targets
-standard 4", 6" substrate
-RF and DC power processing
-available co-sputtering and multi-layer processing
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Sputter system for Oxide semiconductor
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ALD system for TiO2, Al2O3, Al-doped TiO2